Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 2/20 | 0.45 |
| ▸ | ADRB1 | P08588 | 2/20 | 0.45 |
| ▸ | ADRB3 | P13945 | 2/20 | 0.45 |
| ▸ | RAB9A | P51151 | 3/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.40 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.40 |
| ▸ | PARP1 | P09874 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29498969 | 0.90 | ADRB2 (0.49) | ADRB2ADRB1ADRB3RAB9AMAPT | |
| SCHEMBL15902738 | 0.90 | ADRB2 (0.49) | ADRB2ADRB1ADRB3RAB9AMAPT | |
| SCHEMBL95780 | 0.90 | ADRB2 (0.49) | ADRB2ADRB1ADRB3RAB9AMAPT | |
| SCHEMBL3629558 | 0.85 | TDP1 (0.58) | ADRB2ADRB1ADRB3L3MBTL1MAPT | |
| SCHEMBL2787303 | 0.81 | ADRB2 (0.39) | ADRB2ADRB1ADRB3RAB9AL3MBTL1 | |
| SCHEMBL2787300 | 0.81 | ADRB2 (0.47) | ADRB2ADRB1ADRB3RAB9AL3MBTL1 | |
| SCHEMBL20457633 | 0.80 | ALDH1A1 (0.53) | RAB9ATDP1ALDH1A1TSHRHSD17B10 | |
| SCHEMBL23037380 | 0.78 | TDP1 (0.66) | ADRB2ADRB1ADRB3RAB9AMAPT | |
| SCHEMBL9067303 | 0.77 | ADRB2 (0.43) | ADRB2ADRB1ADRB3RAB9AMAPT | |
| SCHEMBL2787301 | 0.77 | ADRB2 (0.44) | ADRB2ADRB1ADRB3RAB9AL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140284306-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | KABUSHIKI KAISHA TOSHIBA (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8778201-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8435416-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8394877-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKA KAISHA TOSHIBA (JP) | 2013-03-12 | — | — | US | disclosed |
| US-20120037594-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20120041121-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20120037595-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI (JP) | 2012-02-16 | — | — | US | disclosed |
| US-8043520-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20090130380-A1 | METHOD FOR MANUFACTURING POUROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI | 2009-05-21 | — | — | US | disclosed |
| US-7517466-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-04-14 | — | — | US | disclosed |
| US-7090784-B2 | Forming pattern using graft polymer containing metal particles; overcoating substrates; removal polymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-08-15 | — | — | US | disclosed |
| US-20060160014-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2006-07-20 | — | — | US | disclosed |
| US-20050287469-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2005-12-29 | — | — | US | disclosed |
| EP-1560069-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-1548499-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-20040081912-A1 | Photosensitive polysilazane composition and method of forming patterned polysilazane film | AZ ELECTRONIC MATERIALS USA CORP. | 2004-04-29 | — | — | US | disclosed |
| US-20040050816-A1 | Forming pattern using graft polymer containing metal particles; overcoating substrates; removal polymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-03-18 | — | — | US | disclosed |
| US-20030222048-A1 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-04 | — | — | US | disclosed |
| US-6565763-B1 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-05-20 | — | — | US | disclosed |
| EP-1164435-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM | TonenGeneral Sekiyu K.K. (JP) | 2001-12-19 | — | — | EP | disclosed |