SCHEMBL6129304

SCHEMBL6129304

Nc1cccc(N=Nc2ccccc2)c1[N+](=O)[O-]

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 8/20 0.44
▸ KMT2A Q03164 8/20 0.44
▸ MAPK1 P28482 5/20 0.44
▸ MAPT P10636 5/20 0.44
▸ TDP1 Q9NUW8 4/20 0.44
▸ NPC1 O15118 4/20 0.44
▸ L3MBTL1 Q9Y468 2/20 0.44
▸ SMN1; SMN2 Q16637 4/20 0.42
▸ CYP3A4 P08684 3/20 0.42
▸ ALDH1A1 P00352 3/20 0.42
▸ TSHR P16473 2/20 0.42
▸ TP53 P04637 1/20 0.42
▸ RAB9A P51151 5/20 0.42
▸ GAA P10253 1/20 0.42
▸ PKM P14618 1/20 0.40
▸ HTT P42858 1/20 0.40
▸ HBB P68871 2/20 0.39
▸ USP2 O75604 1/20 0.39
▸ LMNA P02545 1/20 0.39
▸ CYP1A2 P05177 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28220369 0.82 GPR35 (0.47) MEN1KMT2AMAPTTDP1NPC1
SCHEMBL27614713 0.81 PMM2 (0.46) MEN1KMT2AMAPK1MAPTTDP1
SCHEMBL9258251 0.81 GPR35 (0.50) MEN1KMT2AMAPK1MAPTTDP1
SCHEMBL28233524 0.81 GRIN2D (0.41) MEN1KMT2AMAPK1MAPTTDP1
SCHEMBL11594107 0.77 PLAU (0.46) MEN1KMT2AMAPK1MAPTTDP1
SCHEMBL10609813 0.76 APP (0.41) MEN1KMT2AMAPK1MAPTTDP1
Sulfuric Acid SCHEMBL6759139 0.76 GPR35 (0.45) MEN1KMT2ANPC1SMN1; SMN2TSHR
SCHEMBL8990181 0.75 RAB9A (0.53) MEN1KMT2AMAPK1MAPTTDP1
SCHEMBL8606801 0.75 RAB9A (0.53) MEN1KMT2AMAPK1MAPTTDP1
SCHEMBL30681210 0.75 CCNT1 (0.54) MEN1KMT2AMAPK1MAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5652327-A Triazine polymers HOECHST AKTIENGESELLSCHAFT (DE) 1997-07-29 — — US claimed
EP-0668529-A2 Triazine polymers HOECHST AKTIENGESELLSCHAFT (DE) 1995-08-23 — — EP claimed
US-5326661-A Photorefractive polymers containing discrete photoconductive and electrooptical units HOECHST CELANESE CORP. (US) 1994-07-05 — — US claimed
US-4105838-A LAYERS OF METAL COMPLEX WITH ORGANIC COMPOUND OR DYE ON REACTION VESSEL SURFACES, ANTISCALING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1978-08-08 — — US claimed
CN-106243005-A 3,5 dimethyl sulphur-based 2,4 2 (4,4 ' dinitro azo phenylamino azo group) toluene and preparation method and application 山西大同大学 2016-12-21 — — CN disclosed
US-6864347-B2 Nonlinear optical chiral compounds and devices incorporating same KVH INDUSTRIES, INC. (US) 2005-03-08 — — US disclosed
US-20030161605-A1 Nonlinear optical chiral compounds and devices incorporating same KVH INDUSTRIES, INC. 2003-08-28 — — US disclosed
WO-2003003112-A1 NONLINEAR OPTICAL CHIRAL COMPOUNDS AND DEVICES INCORPORATING SAME KVH INDUSTRIES, INC. (US) 2003-01-09 — — WO disclosed
US-6288206-B1 MIXED WITH DYE; HEAT RESISTANCE, STABILITY; ELECTROOPTICS; MOLECULAR OPTOELECTRONICS CORPORATION 2001-09-11 — — US disclosed
WO-2000054103-A1 CHIRAL POLYMER COMPOSITIONS EXHIBITING NONLINEAR OPTICAL PROPERTIES MOLECULAR OPTOELECTRONICS CORPORATION (US) 2000-09-14 — — WO disclosed
EP-0514786-B1 Hologram recording material, hologram recording device, method of manufacturing the same, and method of hologram recording MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1997-03-19 — — EP disclosed
US-5569565-A Hologram recording material MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1996-10-29 — — US disclosed
EP-0668529-A2 Triazine polymers HOECHST AKTIENGESELLSCHAFT (DE) 1995-08-23 — — EP disclosed
US-5326661-A Photorefractive polymers containing discrete photoconductive and electrooptical units HOECHST CELANESE CORP. (US) 1994-07-05 — — US disclosed
US-5294684-A Antiscaling agents with vinyl chloride polymers and polyvinyl alcohol with hydroxypropylmethyl cellulose SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-03-15 — — US disclosed
EP-0514786-A2 Hologram recording material, hologram recording device, method of manufacturing the same, and method of hologram recording MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1992-11-25 — — EP disclosed
US-4845174-A REACTOR WITH ANTISCALING COATING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1989-07-04 — — US disclosed
US-4180634-A USING ZODIDE SALTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1979-12-25 — — US disclosed
US-4105838-A LAYERS OF METAL COMPLEX WITH ORGANIC COMPOUND OR DYE ON REACTION VESSEL SURFACES, ANTISCALING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1978-08-08 — — US disclosed
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