1,2-Naphthoquinone

1,2-Naphthoquinone

SCHEMBL6131201

O=C(c1ccccc1)c1c(O)cc(O)cc1O.O=C1C=Cc2ccccc2C1=O

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPRC P08575 4/20 0.59
MEN1 O00255 3/20 0.56
KMT2A Q03164 3/20 0.56
ALDH1A1 P00352 3/20 0.56
POLB P06746 2/20 0.56
LMNA P02545 2/20 0.56
MAPT P10636 2/20 0.56
KDM4E B2RXH2 1/20 0.56
BCHE P06276 1/20 0.56
THRB P10828 1/20 0.56
PKM P14618 1/20 0.56
IDO1 P14902 1/20 0.56
HPGD P15428 1/20 0.56
ALOX15 P16050 1/20 0.56
PTPN1 P18031 1/20 0.56
ACHE P22303 1/20 0.56
CES1 P23141 1/20 0.56
RECQL P46063 1/20 0.56
HSD17B10 Q99714 1/20 0.56
PTPN22 Q9Y2R2 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzophenone SCHEMBL27634639 0.85 PTPRC (0.73) PTPRCMEN1KMT2AALDH1A1POLB
1,2-Naphthoquinone SCHEMBL28756423 0.82 ALDH1A1 (0.57) PTPRCMEN1KMT2AALDH1A1POLB
1,2-Naphthoquinone SCHEMBL27710105 0.81 PTPRC (0.57) PTPRCMEN1KMT2AALDH1A1POLB
1,2-Naphthoquinone SCHEMBL28251060 0.79 MEN1 (0.57) PTPRCMEN1KMT2AALDH1A1POLB
1,2-Naphthoquinone SCHEMBL27650402 0.78 PTPRC (0.77) PTPRCMEN1KMT2AALDH1A1POLB
1,2-Naphthoquinone SCHEMBL27655395 0.78 PTPRC (0.77) PTPRCMEN1KMT2AALDH1A1POLB
1,2-Naphthoquinone SCHEMBL27589121 0.78 PTPRC (0.53) PTPRCMEN1KMT2AALDH1A1POLB
SCHEMBL353943 0.78 FASN (0.64) MEN1KMT2AALDH1A1POLBLMNA
1,2-Naphthoquinone SCHEMBL28231268 0.77 PTPRC (0.74) PTPRCMEN1KMT2AALDH1A1POLB
1,2-Naphthoquinone SCHEMBL27613969 0.77 PTPRC (0.74) PTPRCMEN1KMT2AALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108931886-A Curable adhensive compositions, hardenite and liquid crystal display element 捷恩智株式会社 2018-12-04 CN disclosed
CN-108693706-A Photosensitive composite and its application 捷恩智株式会社 2018-10-23 CN disclosed
CN-108628097-A Photosensitive composite, cured film, colored filter, display element, solid-state imager and LED illuminant heart 捷恩智株式会社 2018-10-09 CN disclosed
CN-108628094-A Photosensitive composite, cured film, colored filter and electronic device 捷恩智株式会社 2018-10-09 CN disclosed
CN-108535958-A Photosensitive composite, cured film, colored filter, interlayer dielectric and application type polarizer 捷恩智株式会社 2018-09-14 CN disclosed
CN-108342044-A Photosensitive composite and application thereof 捷恩智株式会社 2018-07-31 CN disclosed
CN-107918245-A Curable adhensive compositions and its cured film, the display element comprising cured film 捷恩智株式会社 2018-04-17 CN disclosed
CN-107778485-A Polyesteramide acid and the photosensitive composite containing it 捷恩智株式会社 2018-03-09 CN disclosed
CN-105954972-A A photosensitive composition, a cured membrane, a color filter, a display element, a solid shooting element, a touch screen and an LED illuminant body 捷恩智株式会社 2016-09-21 CN disclosed
CN-105607419-A PHOTOSENSITIVE COMPOSITION AND USE THEREOF JNC CORP 2016-05-25 CN disclosed
CN-101154041-A Radiation sensitive resin composition, and formation of interlayer insulating film and microlens JSR CORP (JP) 2008-04-02 CN disclosed
CN-101097404-A Homocercal chromatic radiation sensitive resin combination SUMITOMO CHEMICAL CO (JP) 2008-01-02 CN disclosed
CN-1975574-A Radiation sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2007-06-06 CN disclosed
CN-1903942-A Radiation sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2007-01-31 CN disclosed
CN-1800981-A Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO LTD (KR) 2006-07-12 CN disclosed
CN-1716094-A Radiation sensitive resin composition SUMITOMO CHEM ENG (JP) 2006-01-04 CN disclosed
US-6881529-B2 Positive photoresist transfer material and method for processing surface of substrate using the transfer material FUJI PHOTO FILM CO., LTD. (JP) 2005-04-19 US disclosed
CN-1584631-A Dye-containing resist composition and color filter using same NISSAN CHEMICAL IND LTD (JP) 2005-02-23 CN disclosed
CN-1550893-A Solidified resin pattern forming method 住友化学工业株式会社 2004-12-01 CN disclosed
EP-0211667-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-02-25 EP disclosed