Propene

Propene

SCHEMBL6131234

C=CC.CCOCCC(=O)OCC.COCCOC(C)=O

nearest known ligand 0.51

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.51
TSHR P16473 4/20 0.51
THRB P10828 1/20 0.39
HSD17B10 Q99714 2/20 0.37
LMNA P02545 1/20 0.37
CYP1A2 P05177 1/20 0.34
CYP4F2 P78329 2/20 0.33
CYP4A11 Q02928 2/20 0.33
GAA P10253 2/20 0.32
MGAM O43451 1/20 0.32
SI P14410 1/20 0.32
MGAM2 Q2M2H8 1/20 0.32
NR1I2 O75469 1/20 0.32
PGR P06401 1/20 0.32
ADORA3 P0DMS8 1/20 0.32
PTGS2 P35354 1/20 0.32
PDE4D Q08499 1/20 0.32
DGKA P23743 1/20 0.31
TRPA1 O75762 1/20 0.31
CYP3A4 P08684 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propene SCHEMBL6131238 0.95 ALDH1A1 (0.46) ALDH1A1TSHRTHRBHSD17B10LMNA
Propene SCHEMBL19714335 0.88 ALDH1A1 (0.68) ALDH1A1TSHRTHRBHSD17B10LMNA
Propene SCHEMBL6131231 0.85 ALDH1A1 (0.38) ALDH1A1TSHR
Ethyl Acetate SCHEMBL5148148 0.84 ALDH1A1 (0.54) ALDH1A1TSHRTHRBHSD17B10LMNA
SCHEMBL28084236 0.84 CYP1A2 (0.45) ALDH1A1TSHRTHRBHSD17B10LMNA
SCHEMBL9641338 0.83 ALDH1A1 (0.52) ALDH1A1TSHRTHRBHSD17B10LMNA
SCHEMBL22028651 0.82 ALDH1A1 (0.70) ALDH1A1TSHRTHRBHSD17B10LMNA
SCHEMBL29045278 0.81 CYP1A2 (0.45) ALDH1A1TSHRTHRBHSD17B10LMNA
SCHEMBL31299937 0.81 TSHR (0.48) ALDH1A1TSHRTHRBHSD17B10CYP1A2
Propene SCHEMBL27869596 0.81 ALDH1A1 (0.79) ALDH1A1TSHRTHRBHSD17B10LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050079441-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2005-04-14 US disclosed