Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.30 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propene SCHEMBL6131234 | 0.95 | ALDH1A1 (0.51) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| Propene SCHEMBL6131231 | 0.88 | ALDH1A1 (0.38) | ALDH1A1TSHR | |
| Propene SCHEMBL19714335 | 0.83 | ALDH1A1 (0.68) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| Propene SCHEMBL5146965 | 0.83 | ALDH1A1 (0.41) | ALDH1A1TSHRLMNAHSD17B10 | |
| Ethyl Acetate SCHEMBL5148148 | 0.80 | ALDH1A1 (0.54) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL28084236 | 0.80 | CYP1A2 (0.45) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL9641338 | 0.79 | ALDH1A1 (0.52) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| Propene SCHEMBL5145274 | 0.78 | ALDH1A1 (0.38) | ALDH1A1TSHRLMNAHSD17B10 | |
| SCHEMBL22028651 | 0.78 | ALDH1A1 (0.70) | ALDH1A1TSHRTHRBLMNAHSD17B10 | |
| SCHEMBL31299937 | 0.76 | TSHR (0.48) | ALDH1A1TSHRTHRBHSD17B10CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050079441-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2005-04-14 | — | — | US | disclosed |