SCHEMBL6131321

SCHEMBL6131321

CCCCCCCCCCCCOc1c(Cl)cccc1C(N)=O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.61
CYP3A4 P08684 2/20 0.61
KMT2A Q03164 2/20 0.61
MEN1 O00255 1/20 0.61
NR1I2 O75469 1/20 0.61
CHRM2 P08172 1/20 0.61
ADRA2A P08913 1/20 0.61
MAPT P10636 1/20 0.61
OPRK1 P41145 1/20 0.61
HTR2B P41595 1/20 0.61
SLC6A3 Q01959 1/20 0.61
HDAC6 Q9UBN7 1/20 0.61
ALDH1A1 P00352 2/20 0.48
TSHR P16473 2/20 0.48
KDM4E B2RXH2 1/20 0.46
POLB P06746 1/20 0.46
HSD17B10 Q99714 1/20 0.46
TP53 P04637 1/20 0.45
MAPK1 P28482 1/20 0.45
CNR1 P21554 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11044270 0.87 PTPN11 (0.51) LMNACYP3A4KMT2AMEN1NR1I2
SCHEMBL11054339 0.84 LMNA (0.47) LMNACYP3A4KMT2AMEN1NR1I2
SCHEMBL27616827 0.82 CCNB2 (0.52) LMNACYP3A4KMT2AMEN1NR1I2
SCHEMBL8366030 0.82 LMNA (0.59) LMNACYP3A4KMT2AMEN1NR1I2
SCHEMBL20414593 0.81 L3MBTL1 (0.51) LMNACYP3A4KMT2AMEN1NR1I2
SCHEMBL28107073 0.81 KMT2A (0.47) KMT2AMEN1ALDH1A1TSHRKDM4E
SCHEMBL28226095 0.81 TSHR (0.46) LMNACYP3A4KMT2AMEN1NR1I2
SCHEMBL9698386 0.79 NR5A1 (0.47) KMT2AMEN1MAPTALDH1A1TSHR
SCHEMBL9699724 0.79 NR5A1 (0.47) KMT2AMEN1MAPTALDH1A1TSHR
SCHEMBL28130468 0.78 CYP3A4 (0.55) LMNACYP3A4KMT2AMEN1NR1I2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6924089-B2 Heat-developable photosensitive material and image forming method FUJI PHOTO FILM CO., LTD. (JP) 2005-08-02 US disclosed
US-20030235791-A1 Heat-developable photosensitive material and image forming method FUJI PHOTO FILM CO., LTD. 2003-12-25 US disclosed