Methacrylic Acid

Methacrylic Acid

SCHEMBL6135416

C1CO1.C1CO1.C1CO1.C1CO1.C1CO1.C1CO1.C1CO1.C1CO1.C=C(C)C(=O)O.O=C=NCCCCCCN=C=O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL27842089 0.91 NAAA (0.30)
Methacrylic Acid SCHEMBL28197877 0.84 NAAA (0.42)
Methacrylic Acid SCHEMBL9586478 0.84 NAAA (0.42)
Methacrylic Acid SCHEMBL16892638 0.81
Methacrylic Acid SCHEMBL29217399 0.81 TDP1 (0.32)
Oxirane SCHEMBL5669391 0.81 NAAA (0.31)
Methacrylic Acid SCHEMBL5494408 0.80 TSHR (0.35)
Methacrylic Acid SCHEMBL2870893 0.80 TGFBR1 (0.31)
Acetic Acid SCHEMBL28421734 0.79 FFAR3 (0.35)
Acetone SCHEMBL9650262 0.77 MIF (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1507171-A2 Light-Sensitive sheet comprising support, first and second light-sensitive layers and barrier layer FUJI PHOTO FILM CO., LTD. (JP) 2005-02-16 EP disclosed