SCHEMBL6137384

SCHEMBL6137384

C=C(C)C(=O)O[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL3342142 0.93 ALDH1A1 (0.44)
SCHEMBL10897664 0.81
SCHEMBL21065525 0.78
SCHEMBL3898586 0.77 ALDH1A1 (0.50)
SCHEMBL2779555 0.77 ALDH1A1 (0.44)
SCHEMBL29279024 0.76
SCHEMBL6910857 0.74 ALDH1A1 (0.46)
SCHEMBL1070984 0.74 ALDH1A1 (0.52)
SCHEMBL9546020 0.74 ALDH1A1 (0.41)
SCHEMBL10432431 0.74 ALDH1A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116940326-A Antiperspirant compositions 科蒂公司 2023-10-24 CN claimed
CN-101213070-B Rapid replication process and radiation curable composition for use therein UNIV WIEN TECH 2012-06-27 CN claimed
CN-101213070-A Rapid replication process and radiation curable composition for use therein UNIV WIEN TECH (AT) 2008-07-02 CN claimed
CN-117425470-A Antiperspirant compositions 科蒂公司 2024-01-19 CN disclosed
EP-3222435-B1 METHOD FOR MANUFACTURING PRINTED MATTER TORAY INDUSTRIES (JP) 2021-11-24 EP disclosed
US-20170320312-A1 METHOD FOR MANUFACTURING PRINTED MATTER TORAY INDUSTRIES, INC. (JP) 2017-11-09 US disclosed
EP-3222435-A1 METHOD FOR MANUFACTURING PRINTED MATTER Toray Industries, Inc. (JP) 2017-09-27 EP disclosed
CN-102245617-B Process for silylation of monocarboxylic acids BASF SE 2015-03-04 CN disclosed
CN-101213070-B Rapid replication process and radiation curable composition for use therein UNIV WIEN TECH 2012-06-27 CN disclosed
CN-102245617-A Process for silylation of monocarboxylic acids BASF SE 2011-11-16 CN disclosed
CN-101213070-A Rapid replication process and radiation curable composition for use therein UNIV WIEN TECH (AT) 2008-07-02 CN disclosed
US-6319557-B1 FORMING MULTILAYER OVERCOATING, COLORING, THERMOSETTING RESIN FILMS, EPOXY ACRYLIC RESINS AND CATALYST KANSAI PAINT CO., LTD. (JP) 2001-11-20 US disclosed
US-6262147-B1 AS TOP COATS TO AUTOMOBILES KANSAI PAINT CO., LTD. (JP) 2001-07-17 US disclosed
EP-1103574-A1 Emulsions and process of preparing emulsions and oily compositions Dow Corning Toray Silicone Co., Ltd. (JP) 2001-05-30 EP disclosed
US-6197988-B1 DECOMPOSITION IN PRESENCE OF LEWIS ACID METAL HALIDE DOW CORNING TORAY SILICONE CO., LTD. (JP) 2001-03-06 US disclosed
US-6015848-A CURABLE MIXTURE OF ALICYCLIC EPOXY COMPOUND, EPOXY GROUP-CONTAINING ACRYLIC RESIN, CATIONIC POLYMERIZATION CATALYST, AND FLUOROPOLYMER KANSAI PAINT CO., LTD. (JP) 2000-01-18 US disclosed
EP-0846739-A2 Coating composition and method for application thereof KANSAI PAINT CO., LTD. (JP) 1998-06-10 EP disclosed
EP-0571187-B1 Aqueous surface coating composition NIPPON PAINT CO LTD (JP) 1997-08-13 EP disclosed
EP-0571187-A1 Aqueous surface coating composition Nippon Paint Co., Ltd. (JP) 1993-11-24 EP disclosed
EP-0203519-A1 Ethylidenenorbornyl dimethylmethacryloxysilane TOSHIBA SILICONE COMPANY, LTD. (JP) 1986-12-03 EP disclosed