Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNMT1 | P26358 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | STAT3 | P40763 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | NSD2 | O96028 | 3/20 | 0.33 |
| ▸ | APAF1 | O14727 | 2/20 | 0.33 |
| ▸ | TDP2 | O95551 | 2/20 | 0.33 |
| ▸ | HKDC1 | Q2TB90 | 2/20 | 0.33 |
| ▸ | TTR | P02766 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | GALK1 | P51570 | 1/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.31 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Triaziquone SCHEMBL424867 | 0.99 | DNMT1 (0.39) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL5974054 | 0.97 | DNMT1 (0.38) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL3086309 | 0.97 | DNMT1 (0.38) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL23174808 | 0.88 | DNMT1 (0.37) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL17041892 | 0.88 | DNMT1 (0.37) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL6381180 | 0.88 | DNMT1 (0.34) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL7946775 | 0.87 | DNMT1 (0.33) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL8491679 | 0.86 | NSD2 (0.33) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL7545576 | 0.85 | NSD2 (0.32) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL6848459 | 0.84 | GPR84 (0.34) | DNMT1TP53MAPTSTAT3HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| CN-113785243-B | Composition for resist pattern metallization process | 日产化学株式会社 | 2025-05-02 | — | — | CN | disclosed |
| US-20240199924-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-117776546-A | Anti-reflection glass | 福美化学工业株式会社 | 2024-03-29 | — | — | CN | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| CN-117716295-A | Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-117460995-A | Composition for forming underlayer film of silicon-containing resist | 日产化学株式会社 | 2024-01-26 | — | — | CN | disclosed |
| WO-2024019064-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | 日産化学株式会社 | 2024-01-25 | — | — | WO | disclosed |
| CN-117425632-A | Anti-reflection glass | 福美化学工业株式会社 | 2024-01-19 | — | — | CN | disclosed |
| CN-115362216-A | Film-forming composition | 日产化学株式会社 | 2022-11-18 | — | — | CN | disclosed |
| CN-115016230-A | Composition for forming silicon-containing resist underlayer film | 日产化学工业株式会社 | 2022-09-06 | — | — | CN | disclosed |
| CN-107235643-B | Method for manufacturing high anti-reflection reinforced glass | 福美化学工业株式会社 | 2022-04-05 | — | — | CN | disclosed |
| CN-112947000-A | Composition for forming silicon-containing EUV resist underlayer film containing sulfonic acid/salt | 日产化学工业株式会社 | 2021-06-11 | — | — | CN | disclosed |
| CN-112558410-A | Composition for forming silicon-containing resist underlayer film having organic group containing aliphatic polycyclic structure | 日产化学工业株式会社 | 2021-03-26 | — | — | CN | disclosed |
| CN-107209460-B | Composition for forming resist underlayer film for lithography containing hydrolyzable silane having carbonate skeleton | 日产化学工业株式会社 | 2020-12-18 | — | — | CN | disclosed |
| WO-2020085508-A1 | FILM-FORMING COMPOSITION | 日産化学株式会社 | 2020-04-30 | — | — | WO | disclosed |
| EP-1117102-B1 | Method of manufacturing material for forming insulating film | JSR CORP (JP) | 2005-08-10 | — | — | EP | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |