SCHEMBL6140183

SCHEMBL6140183

CCOC(C)Oc1ccc(S(OS(=O)(=O)c2ccc(C)cc2)(c2ccc(OC(C)OCC)cc2)c2ccc(N(C)C)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
MAPT P10636 3/20 0.38
LMNA P02545 3/20 0.38
MCL1 Q07820 2/20 0.38
MAPK1 P28482 1/20 0.38
GFER P55789 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CNR2 P34972 2/20 0.36
PPARG P37231 2/20 0.36
POLB P06746 1/20 0.36
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
TSHR P16473 1/20 0.34
MCOLN3 Q8TDD5 1/20 0.34
RAB9A P51151 1/20 0.34
RXFP1 Q9HBX9 1/20 0.34
NR2E3 Q9Y5X4 1/20 0.34
NCOR2 Q9Y618 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6140711 1.00 ALDH1A1 (0.38) ALDH1A1MAPTLMNAMCL1MAPK1
SCHEMBL6140966 0.90 CNR2 (0.35) ALDH1A1LMNAMAPK1TDP1CNR2
SCHEMBL6140497 0.90 CNR2 (0.35) ALDH1A1LMNAMAPK1TDP1CNR2
SCHEMBL6140065 0.81 ALDH1A1 (0.53) ALDH1A1MAPTLMNAMCL1MAPK1
SCHEMBL6140175 0.81 MAPT (0.37) ALDH1A1MAPTLMNAMCL1MAPK1
SCHEMBL6140704 0.81 MAPT (0.37) ALDH1A1MAPTLMNAMCL1MAPK1
SCHEMBL6140602 0.81 LMNA (0.39) ALDH1A1MAPTLMNAMAPK1POLB
SCHEMBL6140392 0.81 LMNA (0.39) ALDH1A1MAPTLMNAMAPK1POLB
SCHEMBL6140742 0.78 CNR2 (0.36) ALDH1A1MAPTLMNAMAPK1TDP1
SCHEMBL6140105 0.78 CNR2 (0.36) ALDH1A1MAPTLMNAMAPK1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6955939-B1 Memory element formation with photosensitive polymer dielectric ADVANCED MICRO DEVICES, INC. (US) 2005-10-18 US disclosed
US-20050045877-A1 PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS MORGAN STANLEY SENIOR FUNDING, INC. 2005-03-03 US disclosed
US-6825060-B1 Photosensitive polymeric memory elements ADVANCED MICRO DEVICES, INC. 2004-11-30 US disclosed
US-6534243-B1 A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature ADVANCED MICRO DEVICES, INC. 2003-03-18 US disclosed
US-6492075-B1 COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST ADVANCED MICRO DEVICES, INC. 2002-12-10 US disclosed
US-6274289-B1 Chemical resist thickness reduction process ADVANCED MICRO DEVICES, INC. 2001-08-14 US disclosed
US-5847218-A Sulfonium salts and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed