SCHEMBL61990

SCHEMBL61990

[CH2]CC1[CH]CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8635139 0.80
SCHEMBL9213223 0.78
SCHEMBL646385 0.78
SCHEMBL2581093 0.78
SCHEMBL7643181 0.77
SCHEMBL4681842 0.75
SCHEMBL9209666 0.75
SCHEMBL9211159 0.75
SCHEMBL3163054 0.74
SCHEMBL3316839 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 222 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103748134-B Preparation has the method for the amine modified polyester resin improving fluidity of molten SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2015-11-25 CN claimed
CN-103748134-A Process for preparing amine-modified polyester resins with improved melt flow SABIC INNOVATIVE PLASTICS 2014-04-23 CN claimed
EP-1509814-A4 ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2008-08-27 EP claimed
EP-1299773-A4 SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-06-21 EP claimed
EP-1509814-A2 ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF Arch Specialty Chemicals, Inc. (US) 2005-03-02 EP claimed
US-6830870-B2 Mixtures of addition copolymers, acid generators and solvents, used as photosensitive coatings in lithography; relief images ARCH SPECIALITY CHEMICALS, INC. 2004-12-14 US claimed
US-6783917-B2 HIGH RESOLUTION, DIMENSIONAL STABILITY; ELECTRONIC DEVICES WITH SMALLER FEATURE SIZES ARCH SPECIALTY CHEMICALS, INC. 2004-08-31 US claimed
US-20040034160-A1 Acetal protected polymers and photoresists compositions thereof ARCH SPECIALITY CHEMICALS, INC. 2004-02-19 US claimed
WO-2003099782-A2 ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2003-12-04 WO claimed
EP-1299773-A1 SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2003-04-09 EP claimed
US-20030065101-A1 Silicon-containing acetal protected polymers and photoresists compositions thereof ARCH SPECIALITY CHEMICALS, INC. 2003-04-03 US claimed
WO-2002082184-A1 SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2002-10-17 WO claimed
EP-0996676-B1 DIENE RUBBER COMPOSITION REINFORCED WITH WHITE FILLER, COMPRISING AS COUPLING AGENT (WHITE FILLER/ELASTOMER) A MULTIFUNCTIONALIZED POLYORGANOSILOXANE MICHELIN & CIE (FR) 2002-06-12 EP claimed
US-6313205-B1 FOR MANUFACTURING TIRE TREADS COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN-MICHELIN & CIE (FR) 2001-11-06 US claimed
EP-0277376-B1 AROMATIC AMIDE GROUPS-CONTAINING DIAMINES AND POLYMERS IN WHICH THESE DIAMINES ARE INCORPORATED AKZO N.V. (NL) 1991-02-27 EP claimed
US-4980444-A Polyamides, polyureas, polyimides; heat resistance, melt processability, high strength fibers, films AKZO N.V. (NL) 1990-12-25 US claimed
EP-0277376-A1 Aromatic amide groups-containing diamines and polymers in which these diamines are incorporated AKZO N.V. (NL) 1988-08-10 EP claimed
US-20240199490-A1 ADDITIVE FOR HYDRAULIC COMPOSITIONS, AND HYDRAULIC COMPOSITION USING SAME OSAKA GAS CO., LTD. (JP) 2024-06-20 US disclosed
EP-0277376-A1 Aromatic amide groups-containing diamines and polymers in which these diamines are incorporated AKZO N.V. (NL) 1988-08-10 EP disclosed
US-4629602-A ALUMINUM ENGINES BASF AKTIENGESELLSCHAFT (DE) 1986-12-16 US disclosed