SCHEMBL6234638

SCHEMBL6234638

[Cs+].[Cs+].[Cs+].[O-][Si]([O-])([O-])F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2370455 1.00
SCHEMBL3914625 0.86
SCHEMBL6704187 0.86
SCHEMBL10457716 0.86
Silver SCHEMBL4167944 0.86
SCHEMBL982831 0.86
SCHEMBL8382747 0.86
SCHEMBL21646130 0.86
SCHEMBL21066112 0.86
SCHEMBL221506 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116395716-A Preparation method of high-purity lithium fluoride 湖北兴发化工集团股份有限公司 2023-07-07 CN claimed
EP-1274536-B1 PROCESS FOR SOLDERING PRODUCTS OF ALUMINUM USING A FLUX SOLVAY FLUOR & DERIVATE (DE) 2005-05-18 EP claimed
US-6880746-B2 Fluorostannate-containing brazing or soldering fluxes and use thereof in brazing or soldering aluminum or aluminum alloys SOLVAY FLUOR UND DERIVATE GMBH (DE) 2005-04-19 US claimed
US-20030102359-A1 Fluorostannate-containing brazing or soldering fluxes and use thereof in brazing or soldering aluminum or aluminum alloys SOLVAY FLUOR UND DERIVATE GMBH (DE) 2003-06-05 US claimed
EP-0575961-A2 Preparation of potassium and cesium fluorides DOWELANCO (US) 1993-12-29 EP claimed
CN-116395716-A Preparation method of high-purity lithium fluoride 湖北兴发化工集团股份有限公司 2023-07-07 CN disclosed
EP-2857357-A1 MAGNESIUM FLUORIDE PARTICLE, METHOD FOR PRODUCING MAGNESIUM FLUORIDE PARTICLE, MAGNESIUM FLUORIDE PARTICLE DISPERSION, METHOD FOR PRODUCING MAGNESIUM FLUORIDE PARTICLE DISPERSION, COMPOSITION FOR FORMING LAYER HAVING LOW REFRACTIVE INDEX, METHOD FOR PRODUCING COMPOSITION FOR FORMING LAYER HAVING LOW REFRACTIVE INDEX, SUBSTRATE WITH LAYER HAVING LOW REFRACTIVE INDEX, AND METHOD FOR PRODUCING SUBSTRATE WITH LAYER HAVING LOW REFRACTIVE INDEX Stella Chemifa Corporation (JP) 2015-04-08 EP disclosed
US-20150072134-A1 MAGNESIUM FLUORIDE PARTICLES, METHOD FOR PRODUCING MAGNESIUM FLUORIDE PARTICLES, DISPERSION SOLUTION OF MAGNESIUM FLUORIDE PARTICLES, METHOD FOR PRODUCING DISPERSION SOLUTION OF MAGNESIUM FLUORIDE PARTICLES, COMPOSITION FOR FORMING LOW REFRACTIVE INDEX LAYER, METHOD FOR PRODUCING COMPOSITION FOR FORMING A LOW REFRACTIVE INDEX LAYER, SUBSTRATE WITH LOW REFRACTIVE INDEX LAYER, AND METHOD FOR MANUFACTURING SUBSTRATE WITH LOW REFRACTIVE INDEX LAYER STELLA CHEMIFA CORPORATION (JP) 2015-03-12 US disclosed
US-6880746-B2 Fluorostannate-containing brazing or soldering fluxes and use thereof in brazing or soldering aluminum or aluminum alloys SOLVAY FLUOR UND DERIVATE GMBH (DE) 2005-04-19 US disclosed
EP-1454706-A1 Components coated with an aluminium-silicon alloy Solvay Fluor und Derivate GmbH (DE) 2004-09-08 EP disclosed
US-20030102359-A1 Fluorostannate-containing brazing or soldering fluxes and use thereof in brazing or soldering aluminum or aluminum alloys SOLVAY FLUOR UND DERIVATE GMBH (DE) 2003-06-05 US disclosed
US-6432221-B1 ALKALI METAL FLUOROZINCATE AS FLUXES FOR ALUMINUM ALLOYS SOLVAY FLUOR UND DERIVATE GMBH (DE) 2002-08-13 US disclosed
EP-0575961-A2 Preparation of potassium and cesium fluorides DOWELANCO (US) 1993-12-29 EP disclosed
EP-0575961-A2 Preparation of potassium and cesium fluorides DOWELANCO (US) 1993-12-29 EP disclosed
US-5241114-A Controlling temperature AMOCO CORPORATION (US) 1993-08-31 US disclosed
US-4203492-A INJECTING NONCORROSIVE ALKALI METAL OR AMMONIUM FLUORIDE SALT SOLUTION AND HALOGENATED HYDROCARBON IN SITU HYDROLYSIS UNION OIL COMPANY OF CALIFORNIA (US) 1980-05-20 US disclosed
US-4072781-A FERROMAGNETIC METAL, PHOSPHOROUS, COPPER, LEAD, SILICON FUJI PHOTO FILM CO., LTD. (JA) 1978-02-07 US disclosed