Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 1/20 | 0.42 |
| ▸ | EP300 | Q09472 | 1/20 | 0.41 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.41 |
| ▸ | NQO1 | P15559 | 1/20 | 0.41 |
| ▸ | IMPDH2 | P12268 | 1/20 | 0.39 |
| ▸ | IMPDH1 | P20839 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | LMNA | P02545 | 4/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.38 |
| ▸ | USP2 | O75604 | 2/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29350011 | 1.00 | IDO1 (0.42) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL15143913 | 0.91 | IDO1 (0.38) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL393466 | 0.91 | CYP1A2 (0.40) | MAPTLMNACYP1A2CYP3A4HSD17B10 | |
| SCHEMBL19810863 | 0.89 | ABCG2 (0.43) | MAPTLMNACYP1A2HSD17B10ALDH1A1 | |
| SCHEMBL6688616 | 0.88 | NQO1 (0.56) | NQO1MAPTLMNAHSD17B10ALDH1A1 | |
| SCHEMBL390360 | 0.87 | PPARG (0.41) | MAPTLMNACYP1A2CYP3A4HSD17B10 | |
| SCHEMBL1044764 | 0.86 | IDO1 (0.43) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL29657689 | 0.86 | IDO1 (0.43) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL3628207 | 0.85 | IDO1 (0.38) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL30628538 | 0.85 | IDO1 (0.38) | IDO1EP300KAT8NQO1IMPDH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4072 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | claimed |
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | claimed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | claimed |
| US-9244354-B2 | Method for producing thick film photoresist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | claimed |
| EP-2937733-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS | IBF - Indústria Brasileira de Filmes S/A (BR) | 2015-10-28 | — | — | EP | claimed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | claimed |
| US-RE38251-E1 | Dihydroperimidines | IMATION CORP. | 2003-09-16 | — | — | US | claimed |
| US-20010008748-A1 | COMPOSITIONS AND PROCESSES FOR PHOTOGENERATION OF ACID | IMATION CORP. | 2001-07-19 | — | — | US | claimed |
| US-5928841-A | Method of photoetching at 180 to 220 | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-07-27 | — | — | US | claimed |
| US-5527659-A | PHOTOSENSITIVITY | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1996-06-18 | — | — | US | claimed |
| US-5496903-A | PHOTPOLYMERIZABLE COATING | NIPPON PAINT COMPANY, LTD. (JP) | 1996-03-05 | — | — | US | claimed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | claimed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | claimed |
| EP-0620500-A2 | Resist and pattern formation using the same | HITACHI, LTD. (JP) | 1994-10-19 | — | — | EP | claimed |
| EP-0568993-A2 | Chemical amplification resist composition | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1993-11-10 | — | — | EP | claimed |
| US-5049481-A | Merocyanine compound | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-17 | — | — | US | claimed |
| EP-0003263-B1 | A METHOD OF FORMING AN IMAGE, AND AN IMAGING ELEMENT FOR INHIBITING IMAGE FORMATION WITH COBALT (III) COMPLEXES | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1982-09-29 | — | — | EP | claimed |
| US-4189323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | claimed |
| EP-0003263-A1 | A method of forming an image, and an imaging element for inhibiting image formation with cobalt (III) complexes | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1979-08-08 | — | — | EP | claimed |