Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 1/20 | 0.43 |
| ▸ | EP300 | Q09472 | 1/20 | 0.42 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.42 |
| ▸ | NQO1 | P15559 | 1/20 | 0.42 |
| ▸ | IMPDH2 | P12268 | 1/20 | 0.40 |
| ▸ | IMPDH1 | P20839 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 4/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | HPGDS | O60760 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | USP2 | O75604 | 2/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29657689 | 1.00 | IDO1 (0.43) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL62367 | 0.86 | IDO1 (0.42) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL29350011 | 0.86 | IDO1 (0.42) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL544836 | 0.81 | ALDH1A1 (0.49) | HPGDLMNAHSD17B10ALDH1A1CYP1A2 | |
| SCHEMBL16117351 | 0.78 | IDO1 (0.47) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL15143913 | 0.78 | IDO1 (0.38) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL6031052 | 0.77 | MAPT (0.48) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL30416160 | 0.77 | MAPT (0.48) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL11406614 | 0.77 | MAPT (0.48) | IDO1EP300KAT8NQO1IMPDH2 | |
| SCHEMBL30620880 | 0.77 | MAPT (0.48) | IDO1EP300KAT8NQO1IMPDH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | claimed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | claimed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | claimed |
| US-11746255-B2 | Hard-mask composition | IRRESISTIBLE MATERIALS LTD (GB) | 2023-09-05 | — | — | US | disclosed |
| US-10438808-B2 | Hard-mask composition | IRRESISTIBLE MATERIALS, LTD (GB) | 2019-10-08 | — | — | US | disclosed |
| US-10290500-B2 | Spin on hard mask material | IRRESISTIBLE MATERIALS LTD (GB) | 2019-05-14 | — | — | US | disclosed |
| US-20190127604-A1 | HARD-MASK COMPOSITION | NANO-C, INC. | 2019-05-02 | — | — | US | disclosed |
| US-20170345669-A1 | HARD-MASK COMPOSITION | NANO-C, INC. | 2017-11-30 | — | — | US | disclosed |
| US-20170278703-A1 | Spin On Hard Mask Material | IRRESISTIBLE MATERIALS LTD (GB) | 2017-09-28 | — | — | US | disclosed |
| US-20150010703-A1 | Spin on Hard-Mask Material | THE UNIVERSITY OF BIRMINGHAM (GB) | 2015-01-08 | — | — | US | disclosed |
| CN-104159956-A | SPIN ON HARD-MASK MATERIAL | UNIV BIRMINGHAM | 2014-11-19 | — | — | CN | disclosed |
| US-6110641-A | Radiation sensitive composition containing novel dye | SHIPLEY COMPANY, L.L.C. (US) | 2000-08-29 | — | — | US | disclosed |
| US-5910394-A | RADIATION SENSITIVE CURED COATING WHICH EXHIBITS SUBSTANTIAL FLEXIBILITY AND REDUCES LINE GROWTH | SHIPLEY COMPANY, L.L.C. (US) | 1999-06-08 | — | — | US | disclosed |
| US-5866299-A | BLEND OF ALKALI SOLUBLE RESIN AND PHOTOACID GENERATING COMPOUND | SHIPLEY COMPANY, L.L.C. (US) | 1999-02-02 | — | — | US | disclosed |
| EP-0621509-B1 | Use of a radiation sensitive composition in the production of a liquid crystal display device | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-28 | — | — | EP | disclosed |
| US-5609988-A | NEGATIVE RESIST, NOVOLAK, METHYLOL OR METHOXYMETHYL CURING AGENT, 2-BENZODIOXOLYL-4,6-BIS(TRICHLOROMETHYL)TRIAZINE ACID GENERATING AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-03-11 | — | — | US | disclosed |
| EP-0621508-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-09-25 | — | — | EP | disclosed |
| US-5494777-A | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-02-27 | — | — | US | disclosed |
| EP-0621509-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |
| EP-0621508-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-10-26 | — | — | EP | disclosed |