SCHEMBL6243158

SCHEMBL6243158

O=Cc1ccccc1Oc1cccc(O)c1O

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ERN1 O75460 4/20 0.62
LMNA P02545 4/20 0.56
KMT2A Q03164 3/20 0.56
GAA P10253 3/20 0.56
TRIM24 O15164 1/20 0.55
TRIM33 Q9UPN9 1/20 0.55
TLR2 O60603 1/20 0.53
TLR1 Q15399 1/20 0.53
TLR6 Q9Y2C9 1/20 0.53
ALDH1A1 P00352 4/20 0.50
HPGD P15428 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
HTT P42858 1/20 0.50
CYP1A2 P05177 1/20 0.50
CYP2C9 P11712 1/20 0.50
CYP2C19 P33261 1/20 0.50
NPSR1 Q6W5P4 2/20 0.49
SRC P12931 1/20 0.49
CA1 P00915 1/20 0.49
CA2 P00918 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8371447 0.89 LMNA (0.60) ERN1LMNAKMT2AGAATRIM24
SCHEMBL4434944 0.84 LMNA (0.75) ERN1LMNAKMT2AGAATRIM24
Hydroquinone SCHEMBL28796427 0.84 LMNA (0.55) ERN1LMNAKMT2AGAATRIM24
SCHEMBL31599172 0.82 LMNA (0.72) ERN1LMNAKMT2AGAATRIM24
SCHEMBL9639641 0.82 LMNA (0.72) ERN1LMNAKMT2AGAATRIM24
SCHEMBL11062232 0.82 LMNA (0.49) ERN1LMNAKMT2AGAATRIM24
Phenol SCHEMBL10718089 0.81 LMNA (0.66) ERN1LMNAKMT2AGAATRIM24
SCHEMBL9761385 0.80 ERN1 (0.49) ERN1LMNAKMT2AGAATRIM24
SCHEMBL88340 0.79 LMNA (0.64) ERN1LMNAKMT2AGAAALDH1A1
SCHEMBL27576874 0.78 ERN1 (0.53) ERN1KMT2AGAATRIM24TRIM33

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1072614-B1 Method for polymerizing vinyl monomers in a coated reactor SHINETSU CHEMICAL CO (JP) 2005-07-06 EP disclosed
EP-0934955-B1 Polymerization process characterized by a two layer coating against scale formation deposited using a steam carrier SHINETSU CHEMICAL CO (JP) 2003-04-16 EP disclosed
US-6362291-B1 PRETREATING VESSEL HAS ANTIDEPOSIT COATING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-03-26 US disclosed
US-6355743-B1 COMPLEXING IRON WITH OXYCARBOXYLIC ACID CHELATE COMPOUND; ANTISCALING OF INTERIOR WALLS OF BAFFLE VESSELS; DISCOLORATION INHIBITION; ADDITION POLYMERIZATION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-03-12 US disclosed
US-6335403-B1 ANTISCALING AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-01-01 US disclosed
US-6320001-B1 COATING INNER WALL SURFACES WITH A POLYMER SCALE PREVENTIVE FILM OF AN AROMATIC OR HETEROCYCLIC COMPOUND HAVING 5 OR MORE CONJUGATED PI BONDS DYE AND/OR PIGMENT ON THE FIRST LAYER AND A SECOND LAYER OF A DYE AND/OR PIGMENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-11-20 US disclosed
US-6288177-B1 ADDITION POLYMERIZATION IN PRESENCE OF ANTISCALE AND ANTIDEPOSIT AGENTS; COMPLEXING IRON SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-09-11 US disclosed
EP-1072614-A1 Method for polymerizing vinyl monomers in a coated reactor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-01-31 EP disclosed
EP-1063242-A1 Process for producing a polymer by polymerization of a monomer having an ethylenic double bond SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-12-27 EP disclosed
EP-0805168-B1 Vinyl chloride polymer SHINETSU CHEMICAL CO (JP) 2000-11-08 EP disclosed
US-4492740-A CHROMIUM OXIDE ON IRON KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1985-01-08 US disclosed
EP-0118766-A2 Light-sensitive composition KONICA CORPORATION (JP) 1984-09-19 EP disclosed
US-4467027-A O-QUINONEDIAZIDE KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-08-21 US disclosed
EP-0021718-B1 PHOTOSENSITIVE CONDENSATION PRODUCT, PHOTOSENSITIVE COMPOSITIONS AND LITHOGRAPHIC PRINTING PLATES CONTAINING SAID CONDENSATION PRODUCT KONICA CORPORATION (JP) 1984-03-21 EP disclosed
EP-0098166-A2 Support for lithographic printing plate KONICA CORPORATION (JP) 1984-01-11 EP disclosed
EP-0097503-A2 Process for preparing a lithographic printing plate KONICA CORPORATION (JP) 1984-01-04 EP disclosed
EP-0067001-A2 Developer composition KONICA CORPORATION (JP) 1982-12-15 EP disclosed
EP-0054258-A2 Photosensitive compositions KONICA CORPORATION (JP) 1982-06-23 EP disclosed
US-4306010-A Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-12-15 US disclosed
EP-0021718-A1 Photosensitive condensation product, photosensitive compositions and lithographic printing plates containing said condensation product KONICA CORPORATION (JP) 1981-01-07 EP disclosed