Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL19715271 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL7860335 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL1370750 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL5352785 | 0.89 | — | — | |
| SCHEMBL15333 | 0.88 | — | — | |
| SCHEMBL10425917 | 0.88 | FDPS (0.31) | — | |
| SCHEMBL2194227 | 0.82 | — | — | |
| Ammonia Solution, Strong SCHEMBL1083611 | 0.82 | — | — | |
| SCHEMBL9469219 | 0.82 | — | — | |
| SCHEMBL6128086 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10329231-B2 | Epoxy compound, method for producing the same, epoxy resin composition, and cured product thereof | DIC CORPORATION (JP) | 2019-06-25 | — | — | US | disclosed |
| CN-104684902-B | Epoxide, preparation method, composition epoxy resin and its solidfied material | DIC株式会社 | 2019-05-17 | — | — | CN | disclosed |
| US-20180002261-A1 | EPOXY COMPOUND, METHOD FOR PRODUCING THE SAME, EPOXY RESIN COMPOSITION, AND CURED PRODUCT THEREOF | DAINIPPON INK & CHEMICALS (JP) | 2018-01-04 | — | — | US | disclosed |
| US-9738580-B2 | Epoxy compound, method for producing the same, epoxy resin composition, and cured product thereof | DIC CORPORATION (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20150353456-A1 | EPOXY COMPOUND, METHOD FOR PRODUCING THE SAME, EPOXY RESIN COMPOSITION, AND CURED PRODUCT THEREOF | DIC CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| EP-1503998-A1 | HETEROARYL SUBSTITUTED SPIROCYCLIC SUFAMIDES FOR INHIBITION OF GAMMA SECRETASE | MERCK SHARP & DOHME LTD. (GB) | 2005-02-09 | — | — | EP | disclosed |
| WO-2003093252-A1 | HETEROARYL SUBSTITUTED SPIROCYCLIC SULFAMIDES FOR INHIBITION OF GAMMA SECRETASE | MERCK SHARP & DOHME LIMITED (GB) | 2003-11-13 | — | — | WO | disclosed |
| US-4472356-A | FILTER, SEMICONDUCTIVE POLYMER | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1984-09-18 | — | — | US | disclosed |
| US-4079071-A | REACTING WITH HYDROGEN, COPPER CATALYST | UNION CARBIDE CORPORATION (US) | 1978-03-14 | — | — | US | disclosed |