SCHEMBL6257789

SCHEMBL6257789

CCN(CC)c1ccc(N=C2C=CC(=NC#N)c3ccccc32)c(C)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S100B P04271 1/20 0.38
RPS6KA2 Q15349 1/20 0.37
MAPT P10636 9/20 0.36
RAB9A P51151 3/20 0.36
NPC1 O15118 1/20 0.36
ALDH1A1 P00352 6/20 0.35
MEN1 O00255 4/20 0.34
KMT2A Q03164 4/20 0.34
GAA P10253 3/20 0.34
SMN1; SMN2 Q16637 4/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
S1PR1 P21453 2/20 0.33
GFER P55789 3/20 0.32
CYP2C19 P33261 2/20 0.31
NPSR1 Q6W5P4 1/20 0.31
HTT P42858 3/20 0.31
LMNA P02545 2/20 0.31
HSD17B10 Q99714 1/20 0.31
KDM4E B2RXH2 2/20 0.30
HCRTR1 O43613 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13243283 0.84 MAPT (0.35) S100BRPS6KA2MAPTRAB9ANPC1
SCHEMBL5509710 0.83 RPS6KA2 (0.44) S100BRPS6KA2MAPTRAB9ANPC1
SCHEMBL5513455 0.83 RPS6KA2 (0.44) S100BRPS6KA2MAPTRAB9ANPC1
SCHEMBL13222328 0.77 MAPT (0.35) S100BRPS6KA2MAPTRAB9ANPC1
SCHEMBL6257791 0.74 RPS6KA2 (0.36) S100BRPS6KA2MAPTRAB9ANPC1
SCHEMBL5511443 0.73 S100A4 (0.42) S100BRPS6KA2MAPTRAB9ANPC1
SCHEMBL14220963 0.72 MAPT (0.31) RPS6KA2MAPTRAB9ANPC1ALDH1A1
SCHEMBL15338259 0.70 S100B (0.42) S100BRPS6KA2MAPTRAB9ANPC1
SCHEMBL14594205 0.70 RPS6KA2 (0.39) S100BRPS6KA2MAPTRAB9ANPC1
SCHEMBL5513485 0.69 S100B (0.40) S100BRPS6KA2MAPTRAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0949088-B1 PLATE FOR DIRECT THERMAL LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME FUJI PHOTO FILM CO LTD (JP) 2005-10-12 EP disclosed
EP-1580021-A2 Direct, heat sensitive, lithoprinting plate and process for producing the same FUJI PHOTO FILM CO., LTD. (JP) 2005-09-28 EP disclosed
US-6911298-B2 For computer to plate (CTP) printing system FUJI PHOTO FILM CO., LTD. (JP) 2005-06-28 US disclosed
US-20040110082-A1 Used for, printing using oil-based ink FUJIFILM CORPORATION (JP) 2004-06-10 US disclosed
EP-1375186-A1 HEAT-SENSITIVE PLATE MATERIAL FOR LITHOGRAPHIC PLATE FORMATION, PROCESS FOR PRODUCING THE SAME, COATING FLUID, AND LITHOGRAPHIC PLATE FUJI PHOTO FILM CO., LTD. (JP) 2004-01-02 EP disclosed
US-6171748-B1 COMPRISING SUPPORT AND RECORDING LAYER WHICH COMPRISES A POLYVALENT METAL ION AND HYDROPHILIC BINDER POLYMER HAVING LEWIS BASE PORTION CONTAINING NITROGEN, OXYGEN OR SULFUR AND WHICH HAS OLEOPHILIC IMAGE AREA AND HYDROPHILIC NON-IMAGE AREA ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2001-01-09 US disclosed
EP-0949088-A1 PLATE FOR DIRECT THERMAL LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1999-10-13 EP disclosed