Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA5A | P35218 | 2/20 | 0.36 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | PDE4A | P27815 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | APP | P05067 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | NT5E | P21589 | 1/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
| ▸ | CA6 | P23280 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28972134 | 0.87 | — | — | |
| SCHEMBL11294604 | 0.86 | PTGS1 (0.32) | CA5ACA5BPTGS1PDE4ALMNA | |
| SCHEMBL6724605 | 0.85 | — | — | |
| SCHEMBL10701261 | 0.83 | — | — | |
| SCHEMBL6720096 | 0.81 | — | — | |
| SCHEMBL1110060 | 0.81 | — | — | |
| SCHEMBL22260773 | 0.81 | APP (0.32) | APP | |
| SCHEMBL7128938 | 0.81 | — | — | |
| SCHEMBL6721769 | 0.81 | GRIK1 (0.32) | — | |
| SCHEMBL28927179 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6372118-B1 | FOR CORROSION RESISTANT AND WEAR RESISTANT ALLOY; LUSTER; REDUCING AGENT, HARDENER IS PHENYLPROPIOLIC ACID, 2-BUTYNE-1,4-DISULFONIC ACID, 3-DIMETHYLAMINO-1-PROPYNE OR BIS( TRIMETHYLAMINE)-1,2-DIPHENYL-1,2-BIS(DICHLOROBORYL)ETHYLENE | HUI WEN HUA (US) | 2002-04-16 | — | — | US | claimed |
| EP-0736111-B1 | METALLIC SCREEN MATERIAL HAVING A STRAND OR FIBRE STRUCTURE, AND METHOD FOR MANUFACTURING SUCH A MATERIAL | STORK SCREENS BV (NL) | 1999-04-21 | — | — | EP | claimed |
| EP-0736111-A1 | METALLIC SCREEN MATERIAL HAVING A STRAND OR FIBRE STRUCTURE, AND METHOD FOR MANUFACTURING SUCH A MATERIAL | STORK SCREENS B.V. (NL) | 1996-10-09 | — | — | EP | claimed |
| EP-0492731-B1 | Method for forming a sieve material having low internal stress and sieve material so obtained | STORK SCREENS BV (NL) | 1996-03-20 | — | — | EP | claimed |
| WO-1995017534-A1 | METALLIC SCREEN MATERIAL HAVING A STRAND OR FIBRE STRUCTURE, AND METHOD FOR MANUFACTURING SUCH A MATERIAL | STORK SCREENS B.V. (NL) | 1995-06-29 | — | — | WO | claimed |
| US-5282951-A | Method for forming a sieve material having low internal stress and sieve material so obtained | STORK SCREENS, B.V. (NL) | 1994-02-01 | — | — | US | claimed |
| EP-0492731-A1 | Method for forming a sieve material having low internal stress and sieve material so obtained | STORK SCREENS B.V. (NL) | 1992-07-01 | — | — | EP | claimed |
| EP-0025694-B1 | BRIGHT NICKEL PLATING BATH AND PROCESS AND COMPOSITION THEREFOR | M & T CHEMICALS, INC. (US) | 1984-03-28 | — | — | EP | claimed |
| US-4435254-A | ACETYLENIC AMINES AND SULFONATES | M&T CHEMICALS INC. (US) | 1984-03-06 | — | — | US | claimed |
| EP-0025694-A1 | Bright nickel plating bath and process and composition therefor | M & T CHEMICALS, INC. (US) | 1981-03-25 | — | — | EP | claimed |
| US-20260146356-A1 | RHENIUM-COBALT ALLOY COMPOSITION AND PROCESS FOR EFFECTIVE METAL ELECTRODEPOSITION IN 3D-INTEGRATION | MACDERMID ENTHONE INC. (US) | 2026-05-28 | — | — | US | disclosed |
| CN-114059125-A | Cobalt plating compositions comprising additives for void-free sub-micron structure filling | 巴斯夫欧洲公司 | 2022-02-18 | — | — | CN | disclosed |
| CN-109477234-B | Cobalt plating compositions comprising additives for void-free sub-micron structure filling | 巴斯夫欧洲公司 | 2021-12-10 | — | — | CN | disclosed |
| EP-3885475-A1 | COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING | BASF SE (DE) | 2021-09-29 | — | — | EP | disclosed |
| EP-3485069-B1 | COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING | BASF SE (DE) | 2021-04-28 | — | — | EP | disclosed |
| US-4891069-A | CATALYST FOR REDUCTION OF METAL COMPOUND BY GENERATED HYDROGEN | TECHNO INSTRUMENTS INVESTMENTS 1983 LTD. (IL) | 1990-01-02 | — | — | US | disclosed |
| US-4749449-A | PLATING ON CATALYZED THROUGH HOLE WALL IN PATTERENED CONDUCTIVE AND INSULATING LAYERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-06-07 | — | — | US | disclosed |
| EP-0025694-B1 | BRIGHT NICKEL PLATING BATH AND PROCESS AND COMPOSITION THEREFOR | M & T CHEMICALS, INC. (US) | 1984-03-28 | — | — | EP | disclosed |
| US-4435254-A | ACETYLENIC AMINES AND SULFONATES | M&T CHEMICALS INC. (US) | 1984-03-06 | — | — | US | disclosed |
| EP-0025694-A1 | Bright nickel plating bath and process and composition therefor | M & T CHEMICALS, INC. (US) | 1981-03-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260146356-A1 | RHENIUM-COBALT ALLOY COMPOSITION AND PROCESS FOR EFFECTIVE METAL ELECTRODEPOSITION IN 3D-INTEGRATION | NRAS, CA3, RAC3 | CA5A 691/4885CA5B 938/4885PTGS1 4562/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.