SCHEMBL6720096

SCHEMBL6720096

CC#CCS(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28927179 0.97
SCHEMBL6259643 0.81 CA5A (0.36)
SCHEMBL11294604 0.75 PTGS1 (0.32)
SCHEMBL6724605 0.74
SCHEMBL10701261 0.73
SCHEMBL3050586 0.73
SCHEMBL576169 0.72
SCHEMBL14351855 0.71
SCHEMBL1110060 0.71
SCHEMBL22260773 0.71 APP (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117728017-A Composition, flame-retardant gel electrolyte, preparation method of flame-retardant gel electrolyte and battery 浙江正泰电器股份有限公司 2024-03-19 CN claimed
US-4450051-A STABILIZING AN AQUEOUS BATH BY ADDING AN ALKYNE SULFONIC ACID OR SALT; LEVELING; REGENERATION OMI INTERNATIONAL CORPORATION (US) 1984-05-22 US claimed
EP-0025694-B1 BRIGHT NICKEL PLATING BATH AND PROCESS AND COMPOSITION THEREFOR M & T CHEMICALS, INC. (US) 1984-03-28 EP claimed
US-4435254-A ACETYLENIC AMINES AND SULFONATES M&T CHEMICALS INC. (US) 1984-03-06 US claimed
EP-0025694-A1 Bright nickel plating bath and process and composition therefor M & T CHEMICALS, INC. (US) 1981-03-25 EP claimed
CN-117728017-A Composition, flame-retardant gel electrolyte, preparation method of flame-retardant gel electrolyte and battery 浙江正泰电器股份有限公司 2024-03-19 CN disclosed
US-20230165854-A1 COMPOUNDS AND COMPOSITIONS FOR TREATING CONDITIONS ASSOCIATED WITH APJ RECEPTOR ACTIVITY SHOUTI INC. 2023-06-01 US disclosed
US-20220125787-A1 COMPOUNDS AND COMPOSITIONS FOR TREATING CONDITIONS ASSOCIATED WITH APJ RECEPTOR ACTIVITY ANNAPURNA BIO, INC. 2022-04-28 US disclosed
US-20220125787-A1 COMPOUNDS AND COMPOSITIONS FOR TREATING CONDITIONS ASSOCIATED WITH APJ RECEPTOR ACTIVITY ANNAPURNA BIO, INC. 2022-04-28 US disclosed
CN-114059125-A Cobalt plating compositions comprising additives for void-free sub-micron structure filling 巴斯夫欧洲公司 2022-02-18 CN disclosed
CN-109477234-B Cobalt plating compositions comprising additives for void-free sub-micron structure filling 巴斯夫欧洲公司 2021-12-10 CN disclosed
EP-3885475-A1 COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING BASF SE (DE) 2021-09-29 EP disclosed
US-6150303-A Substituted 3-phenylisoxazolines BASF AKTIENGESELLSCHAFT (DE) 2000-11-21 US disclosed
CN-1189824-A 1-amino-3-benzyluracils BASF AG (DE) 1998-08-05 CN disclosed
US-4749449-A PLATING ON CATALYZED THROUGH HOLE WALL IN PATTERENED CONDUCTIVE AND INSULATING LAYERS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1988-06-07 US disclosed
US-4450051-A STABILIZING AN AQUEOUS BATH BY ADDING AN ALKYNE SULFONIC ACID OR SALT; LEVELING; REGENERATION OMI INTERNATIONAL CORPORATION (US) 1984-05-22 US disclosed
US-4450051-A STABILIZING AN AQUEOUS BATH BY ADDING AN ALKYNE SULFONIC ACID OR SALT; LEVELING; REGENERATION OMI INTERNATIONAL CORPORATION (US) 1984-05-22 US disclosed
EP-0025694-B1 BRIGHT NICKEL PLATING BATH AND PROCESS AND COMPOSITION THEREFOR M & T CHEMICALS, INC. (US) 1984-03-28 EP disclosed
US-4435254-A ACETYLENIC AMINES AND SULFONATES M&T CHEMICALS INC. (US) 1984-03-06 US disclosed
EP-0025694-A1 Bright nickel plating bath and process and composition therefor M & T CHEMICALS, INC. (US) 1981-03-25 EP disclosed