SCHEMBL6280313

SCHEMBL6280313

COC(C)c1nc(N)nc(N)n1

nearest known ligand 0.33

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 4/20 0.33
HTR2A P28223 4/20 0.33
HTR6 P50406 4/20 0.33
HTR7 P34969 3/20 0.33
HRH4 Q9H3N8 1/20 0.32
LMNA P02545 1/20 0.31
HTR1A P08908 2/20 0.31
ADORA2A P29274 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1425789 0.73 HRH4 (0.50) HRH4LMNAADORA2A
SCHEMBL20508247 0.73 LMNA (0.36) LMNA
SCHEMBL15429599 0.71 KDM4E (0.36) LMNA
Methoxymethane SCHEMBL108410 0.71 LMNA (0.43) LMNAADORA2A
SCHEMBL6354727 0.70 ALDH1A1 (0.40)
SCHEMBL15994399 0.69 HRH4 (0.52) HRH4LMNAADORA2A
SCHEMBL21989882 0.69 HRH4 (0.34) HRH4LMNAADORA2A
SCHEMBL10717372 0.69 LMNA (0.39) HRH4LMNAADORA2A
SCHEMBL21989883 0.69 HRH4 (0.34) HRH4LMNAADORA2A
SCHEMBL11743129 0.69 HRH4 (0.34) HRH4LMNAADORA2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0793406-B1 Process for producing multilayer wiring boards TOKYO OHKA KOGYO CO LTD (JP) 2005-12-28 EP disclosed
US-6228465-B1 Process for producing multilayer wiring boards TOKYO OHKA KOGYO CO., LTD. (JP) 2001-05-08 US disclosed
US-6010956-A Process for producing multilayer wiring boards TOKYO OHKA KOGYO CO., LTD. (JP) 2000-01-04 US disclosed
EP-0793406-A1 Process for producing multilayer wiring boards TOKYO OHKA KOGYO CO., LTD. (JP) 1997-09-03 EP disclosed
EP-0211121-B1 PROCESS FOR SYNTHESIZING 2-VINYL-4,6-DIAMINO-S-TRIAZINE SHIKOKU CHEMICALS CORPORATION (JP) 1991-12-11 EP disclosed
EP-0151530-B1 ISOCYANURIC ACID ADDUCT OF 2-VINYL-4,6-DIAMINO-S-TRIAZINE, PROCESS FOR SYNTHESIS OF SAID ADDUCT AND PROCESS FOR HARDENING POLYEPOXY RESIN WITH SAID ADDUCT SHIKOKU CHEMICALS CORPORATION (JP) 1987-11-19 EP disclosed
EP-0211121-A1 Process for synthesizing 2-vinyl-4,6-diamino-s-triazine SHIKOKU CHEMICALS CORPORATION (JP) 1987-02-25 EP disclosed
US-4614774-A Isocyanuric acid adduct of 2-vinyl-4,6-diamino-S-triazine, process for synthesis of said adduct and process for hardening polyepoxy resin with said adduct SHIKOKU CHEMICALS CORPORATION (JP) 1986-09-30 US disclosed
US-4596868-A Process for synthesizing 2-vinyl-4,6-diamino-s-triazine SHIKOKU CHEMICALS CORPORATION (JP) 1986-06-24 US disclosed
US-4579946-A Process for synthesis of 2-vinyl-4,6-diamino-S-triazine SHIKOKU CHEMICALS CORPORATION (JP) 1986-04-01 US disclosed
US-4567259-A Isocyanuric acid adduct of 2-vinyl-4,6-diamino-S-triazine SHIKOKU CHEMICALS CORP. (JP) 1986-01-28 US disclosed
EP-0151530-A1 Isocyanuric acid adduct of 2-vinyl-4,6-diamino-S-triazine, process for synthesis of said adduct and process for hardening polyepoxy resin with said adduct SHIKOKU CHEMICALS CORPORATION (JP) 1985-08-14 EP disclosed