SCHEMBL6281610

SCHEMBL6281610

CC(C)[C@H](N)C(=O)N[C@H](C(=O)OCc1ccccc1)C(C)C.NC(=O)CCCCCCCCCCC(N)=O

nearest known ligand 0.50

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CTSB P07858 2/20 0.49
CTSK P43235 1/20 0.49
LNPEP Q9UIQ6 5/20 0.47
ERAP2 Q6P179 4/20 0.47
ERAP1 Q9NZ08 2/20 0.46
IL1RN P18510 1/20 0.46
SLC15A1 P46059 1/20 0.45
ECE1 P42892 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31410669 0.92 CTSB (0.56) CTSBCTSKLNPEPERAP2ERAP1
Hydrochloric Acid SCHEMBL6283276 0.90 CTSB (0.55) CTSBCTSKLNPEPERAP2ERAP1
Hydrochloric Acid SCHEMBL8145737 0.88 CTSB (0.55) CTSBCTSKLNPEPERAP2ERAP1
SCHEMBL15606159 0.82 CTSB (0.52) CTSBCTSKLNPEPERAP2ERAP1
SCHEMBL30902790 0.80 SLC15A1 (0.52) CTSBCTSKSLC15A1
SCHEMBL11911351 0.80 SLC15A1 (0.52) CTSBCTSKSLC15A1
SCHEMBL23051873 0.80 CTSB (0.59) CTSBCTSKLNPEPERAP2ERAP1
Hydrochloric Acid SCHEMBL7326272 0.78 CTSB (0.53) CTSBCTSKECE1
SCHEMBL24050024 0.78 SMN1; SMN2 (0.47) CTSBCTSKLNPEPERAP2ERAP1
SCHEMBL24050020 0.78 SMN1; SMN2 (0.47) CTSBCTSKLNPEPERAP2ERAP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6858318-B2 Metalic nanowire and process for producing the same JAPAN SCIENCE AND TECHNOLOGY CORPORATION (JP) 2005-02-22 US disclosed
US-20040028936-A1 Metalic nanowire and process for producing the same JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2004-02-12 US disclosed