SCHEMBL6281884

SCHEMBL6281884

C=CCOCCOC(F)(F)C(F)(F)S(=O)(=O)O

nearest known ligand 0.30

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.30
POLB P06746 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6283889 0.84 ALDH1A1 (0.32)
SCHEMBL14228106 0.74 ALDH1A1 (0.31)
Sulfuric Acid SCHEMBL324982 0.73 POLB (0.40) MEN1POLBKMT2A
Sulfuric Acid SCHEMBL3260148 0.73 POLB (0.40) MEN1POLBKMT2A
Sulfuric Acid SCHEMBL5612014 0.73 POLB (0.40) MEN1POLBKMT2A
SCHEMBL10019180 0.73 MEN1 (0.34) MEN1POLBKMT2A
SCHEMBL13464683 0.72 ALDH1A1 (0.30)
SCHEMBL28390645 0.71
SCHEMBL16349999 0.70
SCHEMBL6853346 0.70 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6855476-B2 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. (US) 2005-02-15 US disclosed
US-20020197558-A1 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. 2002-12-26 US disclosed