Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6281884 | 0.84 | MEN1 (0.30) | — | |
| SCHEMBL27171244 | 0.82 | CA2 (0.35) | — | |
| SCHEMBL2803263 | 0.82 | — | — | |
| SCHEMBL6047329 | 0.76 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL22735257 | 0.74 | — | — | |
| SCHEMBL30400932 | 0.74 | ALDH1A1 (0.37) | ALDH1A1L3MBTL1 | |
| SCHEMBL14649511 | 0.74 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL6129841 | 0.73 | — | — | |
| SCHEMBL6129888 | 0.73 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1 | |
| SCHEMBL5365972 | 0.72 | ALDH1A1 (0.31) | ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9428485-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-30 | — | — | US | disclosed |
| US-9428485-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-30 | — | — | US | disclosed |
| US-9260542-B2 | Partly fluorinated polyolefins by Ziegler-Natta polymerization | GM Global Technology Operations LLC (US) | 2016-02-16 | — | — | US | disclosed |
| US-20130260287-A1 | Partly Fluorinated Polyolefins by Ziegler-Natta Polymerization | GM Global Technology Operations LLC (US) | 2013-10-03 | — | — | US | disclosed |
| US-8541157-B2 | Resist composition, method of forming resist pattern, compound and acid generator including the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8367297-B2 | Resist composition, method of forming resist pattern, novel compound and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-8338076-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-25 | — | — | US | disclosed |
| US-20120315580-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-12-13 | — | — | US | disclosed |
| US-20120315580-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-12-13 | — | — | US | disclosed |
| US-8206890-B2 | Resist composition, method of forming resist pattern, compound and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20100196820-A1 | Resist composition, method of forming resist pattern, novel compound and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-05 | — | — | US | disclosed |
| US-7745097-B2 | Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-29 | — | — | US | disclosed |
| US-20100136478-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. | 2010-06-03 | — | — | US | disclosed |
| US-20100081088-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20100015552-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-01-21 | — | — | US | disclosed |
| US-20090023095-A1 | NOVEL COMPOUND, MANUFACTURING METHOD THEREOF, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING A RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-22 | — | — | US | disclosed |
| US-6855476-B2 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-02-15 | — | — | US | disclosed |
| US-20020197558-A1 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-26 | — | — | US | disclosed |
| EP-0584328-A1 | PERHALOGENATED SULTONE-DERIVED MONOMERS AND POLYMERS PRODUCED THEREFROM. | CENTRE NAT RECH SCIENT (FR) | 1994-03-02 | — | — | EP | disclosed |
| WO-1993016988-A1 | PERHALOGENATED SULTONE-DERIVED MONOMERS AND POLYMERS PRODUCED THEREFROM | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 1993-09-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100081088-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME | ASIC1, RER1, GRIN1 | ALDH1A1 717/4885L3MBTL1 4447/4885 |
| US-20120315580-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | H1-10, H1-0, C1S | ALDH1A1 2221/4885L3MBTL1 2175/4885 |
| US-20100136478-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | ASIC1, RER1, ABCC1 | ALDH1A1 539/4885L3MBTL1 4226/4885 |
| US-20100196820-A1 | Resist composition, method of forming resist pattern, novel compound and acid generator | ASIC1, RER1, SLC11A2 | ALDH1A1 1311/4885L3MBTL1 4265/4885 |
| US-20090023095-A1 | NOVEL COMPOUND, MANUFACTURING METHOD THEREOF, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING A RESIST PATTERN | C1R, CYP1B1, C1S | ALDH1A1 94/4885L3MBTL1 2882/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.