⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL646830 | 0.67 | — | — | |
| SCHEMBL2110876 | 0.67 | — | — | |
| SCHEMBL34902 | 0.67 | — | — | |
| SCHEMBL3893317 | 0.65 | — | — | |
| SCHEMBL1108445 | 0.64 | — | — | |
| SCHEMBL276184 | 0.64 | — | — | |
| SCHEMBL106986 | 0.64 | — | — | |
| SCHEMBL26106889 | 0.64 | — | — | |
| SCHEMBL93160 | 0.64 | — | — | |
| SCHEMBL2531649 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119593195-A | Hydrophilic material, hydrophobic material, preparation method of hydrophilic material and hydrophobic material, and gas-liquid separation filter device with hydrophilic material and hydrophobic material | 中科瑞丽分离科技无锡有限公司 | 2025-03-11 | — | — | CN | claimed |
| US-20240209234-A1 | NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR | VERSUM MATERIALS US, LLC | 2024-06-27 | — | — | US | claimed |
| EP-4326678-A1 | NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR | Versum Materials US, LLC (US) | 2024-02-28 | — | — | EP | claimed |
| CN-117425621-A | Non-spherical primary silica nanoparticles and uses thereof | 弗萨姆材料美国有限责任公司 | 2024-01-19 | — | — | CN | claimed |
| WO-2022226471-A1 | NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR | VERSUM MATERIALS US, LLC (US) | 2022-10-27 | — | — | WO | claimed |
| US-8216649-B2 | Liquid crystal aligning agent, method of producing a liquid crystal alignment film and liquid crystal display device | JSR CORPORATION (JP) | 2012-07-10 | — | — | US | claimed |
| CN-119593195-A | Hydrophilic material, hydrophobic material, preparation method of hydrophilic material and hydrophobic material, and gas-liquid separation filter device with hydrophilic material and hydrophobic material | 中科瑞丽分离科技无锡有限公司 | 2025-03-11 | — | — | CN | disclosed |
| US-20240209234-A1 | NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR | VERSUM MATERIALS US, LLC | 2024-06-27 | — | — | US | disclosed |
| EP-4326678-A1 | NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR | Versum Materials US, LLC (US) | 2024-02-28 | — | — | EP | disclosed |
| CN-117425621-A | Non-spherical primary silica nanoparticles and uses thereof | 弗萨姆材料美国有限责任公司 | 2024-01-19 | — | — | CN | disclosed |
| US-11801662-B2 | Cementitious panels with polymeric-film facing material | GOLD BOND BUILDING PRODUCTS, LLC (US) | 2023-10-31 | — | — | US | disclosed |
| WO-2022226471-A1 | NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR | VERSUM MATERIALS US, LLC (US) | 2022-10-27 | — | — | WO | disclosed |
| EP-3239111-B1 | CURABLE COMPOSITION, TRANSFER FILM, FRONT PLATE OF IMAGE DISPLAY DEVICE, FRONT PLATE-INTEGRATED SENSOR, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD FOR FRONT PLATE OF IMAGE DISPLAY DEVICE | FUJIFILM CORP (JP) | 2021-02-17 | — | — | EP | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| US-5444023-A | Method of fabricating a semiconductor device having a multilayer wiring structure and using a fluorine compound-containing gas | NEC CORPORATION (JP) | 1995-08-22 | — | — | US | disclosed |
| US-5405805-A | Method for forming interconnect structure, insulating films and surface protective films of semiconductor device | NEC CORPORATION (JP) | 1995-04-11 | — | — | US | disclosed |