Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27616990 | 0.95 | ALDH1A1 (0.48) | ALDH1A1CYP17A1CYP19A1 | |
| Methacrylic Acid SCHEMBL6391090 | 0.93 | ALDH1A1 (0.39) | ALDH1A1CYP17A1CYP19A1 | |
| Acrylic Acid SCHEMBL6297075 | 0.90 | ALDH1A1 (0.41) | ALDH1A1CYP17A1CYP19A1 | |
| SCHEMBL44331 | 0.89 | CYP17A1 (0.40) | ALDH1A1CYP17A1CYP19A1 | |
| Methacrylic Acid SCHEMBL6303616 | 0.88 | ALDH1A1 (0.39) | ALDH1A1CYP17A1CYP19A1 | |
| SCHEMBL6296790 | 0.84 | ALDH1A1 (0.32) | ALDH1A1CYP17A1CYP19A1 | |
| Methacrylic Acid SCHEMBL6298155 | 0.83 | ALDH1A1 (0.42) | ALDH1A1HSD11B1 | |
| SCHEMBL21235008 | 0.82 | CYP17A1 (0.36) | ALDH1A1CYP17A1CYP19A1 | |
| SCHEMBL31239207 | 0.81 | CYP17A1 (0.32) | CYP17A1CYP19A1 | |
| SCHEMBL13900363 | 0.81 | ALDH1A1 (0.39) | ALDH1A1CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6908729-B2 | Amplified photoresist; radiation with ultraviolet radiation | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-06-21 | — | — | US | disclosed |
| US-6764811-B2 | PHOTORESIST FILM; PATTERN EXPOSURE USING ULTRAVIOLET RADIATION, DEVELOPMENT | MATSUSHITA ELECTRIC INDUSTRY CO., LTD. (JP) | 2004-07-20 | — | — | US | disclosed |
| US-20030082486-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
| US-20020142251-A1 | Pattern formation method | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2002-10-03 | — | — | US | disclosed |