⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL152848 | 0.97 | — | — | |
| Ammonia Solution, Strong SCHEMBL21496318 | 0.94 | — | — | |
| Alcohol SCHEMBL28204892 | 0.90 | HSD17B10 (0.31) | — | |
| SCHEMBL28157179 | 0.82 | MEN1 (0.33) | — | |
| SCHEMBL22609414 | 0.82 | MEN1 (0.33) | — | |
| SCHEMBL9153427 | 0.81 | — | — | |
| Hydrochloric Acid SCHEMBL27990839 | 0.80 | MEN1 (0.32) | — | |
| SCHEMBL8068207 | 0.78 | ALDH1A1 (0.36) | — | |
| SCHEMBL1804524 | 0.77 | — | — | |
| SCHEMBL9886705 | 0.77 | DNM1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6933243-B2 | High selectivity and residue free process for metal on thin dielectric gate etch application | APPLIED MATERIALS, INC. (US) | 2005-08-23 | — | — | US | disclosed |
| US-20030148622-A1 | High selectivity and residue free process for metal on thin dielectric gate etch application | APPLIED MATERIALS, INC. | 2003-08-07 | — | — | US | disclosed |