SCHEMBL6311183

SCHEMBL6311183

Cc1ccc(S(=O)(=O)Oc2ccc(S(=O)(=O)O)cc2C)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.57
KMT2A Q03164 4/20 0.49
GFER P55789 1/20 0.49
GAA P10253 4/20 0.49
MEN1 O00255 3/20 0.49
ESR1 P03372 1/20 0.49
ESR2 Q92731 1/20 0.49
ALDH1A1 P00352 6/20 0.47
LMNA P02545 3/20 0.47
MAPK1 P28482 1/20 0.47
CYP2D6 P10635 2/20 0.46
CYP3A4 P08684 1/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
SNCA P37840 1/20 0.45
HTT P42858 2/20 0.43
MAPT P10636 3/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
PKM P14618 1/20 0.42
HPGD P15428 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4927181 0.89 CYP1A2 (0.62) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL6937937 0.86 GAA (0.50) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL13924687 0.85 KMT2A (0.47) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL2066606 0.85 KMT2A (0.47) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL6311175 0.84 GFER (0.64) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL4080290 0.84 KMT2A (0.49) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL4081389 0.83 GFER (0.62) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL6741027 0.81 CYP1A2 (0.61) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL7519257 0.81 CYP1A2 (0.51) CYP1A2KMT2AGFERGAAMEN1
SCHEMBL15249769 0.81 KMT2A (0.51) CYP1A2KMT2AGFERGAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6916591-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-07-12 US disclosed
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process CCNH, PAH, POLH CYP1A2 567/4885KMT2A 890/4885GFER 223/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.