SCHEMBL4080290

SCHEMBL4080290

Cc1ccc(S(=O)(=O)Oc2ccc(S(=O)(=O)Cl)cc2C)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.49
GFER P55789 1/20 0.46
GAA P10253 4/20 0.46
MEN1 O00255 4/20 0.46
ESR1 P03372 1/20 0.46
ESR2 Q92731 1/20 0.46
ALDH1A1 P00352 7/20 0.44
CYP1A2 P05177 2/20 0.44
LMNA P02545 3/20 0.43
MAPK1 P28482 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2D6 P10635 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
MAPT P10636 4/20 0.41
TDP1 Q9NUW8 2/20 0.41
HTT P42858 1/20 0.41
ALPL P05186 1/20 0.40
ALPI P09923 1/20 0.40
KEAP1 Q14145 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6937937 0.86 GAA (0.50) KMT2AGFERGAAMEN1ESR1
SCHEMBL13924687 0.85 KMT2A (0.47) KMT2AGFERGAAMEN1ESR1
SCHEMBL2066606 0.85 KMT2A (0.47) KMT2AGFERGAAMEN1ESR1
SCHEMBL4076121 0.84 GFER (0.60) KMT2AGFERGAAMEN1ALDH1A1
SCHEMBL6311183 0.84 CYP1A2 (0.57) KMT2AGFERGAAMEN1ESR1
SCHEMBL13342832 0.84 KMT2A (0.63) KMT2AGFERGAAMEN1ESR1
SCHEMBL6937941 0.80 KMT2A (0.50) KMT2AGFERGAAMEN1ESR1
SCHEMBL3842869 0.79 GAA (0.45) KMT2AGFERGAAMEN1ESR1
SCHEMBL3839447 0.79 HSD11B1 (0.46) KMT2AGFERGAAMEN1ESR1
SCHEMBL4076262 0.78 KMT2A (0.52) KMT2AGFERGAAMEN1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7494760-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-24 US disclosed
US-20070287096-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-12-13 US disclosed
US-6916591-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-07-12 US disclosed
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030215738-A1 Photoacid generators, chemically amplified resist compositions, and patterning process CCNH, PAH, POLH KMT2A 890/4885GFER 223/4885GAA 1315/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.