SCHEMBL631150

SCHEMBL631150

C=C(C)C(=O)OC(C)OCCC1CCCCC1

nearest known ligand 0.38

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.35
TSHR P16473 1/20 0.34
CTSL P07711 2/20 0.34
CTSB P07858 2/20 0.34
CTSH P09668 1/20 0.34
CTSK P43235 4/20 0.33
EPHX1 P07099 2/20 0.33
PPARG P37231 1/20 0.32
KLK7 P49862 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2059847 0.85 SLC1A3 (0.42) TSHRCTSLCTSBCTSHCTSK
SCHEMBL17471357 0.84 SMN1; SMN2 (0.38) SMN1; SMN2CTSLCTSBCTSHCTSK
SCHEMBL631546 0.79 SMN1; SMN2 (0.35) SMN1; SMN2TSHRCTSLCTSBCTSH
SCHEMBL3267819 0.79 TSHR (0.47) TSHR
SCHEMBL9963788 0.79 KMT2A (0.39) SMN1; SMN2
SCHEMBL16874410 0.78 THRB (0.46) SMN1; SMN2TSHREPHX1
SCHEMBL22567313 0.78 THRB (0.46) SMN1; SMN2TSHREPHX1
SCHEMBL1394651 0.78 THRB (0.46) SMN1; SMN2TSHREPHX1
SCHEMBL16591159 0.77 SMN1; SMN2 (0.38) SMN1; SMN2CTSLCTSBCTSHCTSK
SCHEMBL12431464 0.76 TSHR (0.39) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3253735-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2021-03-31 EP disclosed
US-9994538-B2 Latent acids and their use BASF SE (DE) 2018-06-12 US disclosed
US-9964848-B2 Positive photosensitive resin composition and cured film forming method using the same FUJIFILM CORPORATION (JP) 2018-05-08 US disclosed
US-20180009775-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2018-01-11 US disclosed
EP-2420890-B1 Positive photosensitive resin composition, method for forming cured film and liquid crystal display device FUJIFILM CORP (JP) 2017-03-01 EP disclosed
EP-2613198-B1 PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORP (JP) 2016-12-28 EP disclosed
WO-2016124493-A1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2016-08-11 WO disclosed
US-20150212406-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2015-07-30 US disclosed
US-9034440-B2 Positive photosensitive resin composition and cured film forming method using the same FUJIFILM CORPORATION (JP) 2015-05-19 US disclosed
US-8932800-B2 Positive photosensitive resin composition and method for forming cured film using the same FUJIFILM CORPORATION (JP) 2015-01-13 US disclosed
US-20110177302-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME FUJIFILM CORPORATION (JP) 2011-07-21 US disclosed
CN-102043333-A Photosensitive resin composition, method for producing cured film, cured film, organic el display device and liquid crystal display device FUJIFILM CORP 2011-05-04 CN disclosed
CN-102043334-A Photosensitive resin composition, cured film, method for producing cured film, organic el display device and liquid crystal display device FUJIFILM CORP 2011-05-04 CN disclosed
CN-102043335-A Photosensitive resin composition, cured film, method for producing cured film, organic el display device and liquid crystal display device FUJIFILM CORP 2011-05-04 CN disclosed
EP-2261737-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM FROM THE SAME FUJIFILM Corporation (JP) 2010-12-15 EP disclosed
CN-101809503-A Positive-type photosensitive resin composition, and method for formation of cured film using the same FUJIFILM CORP 2010-08-18 CN disclosed
US-20100173246-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING CURED FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-07-08 US disclosed
EP-2196852-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMATION OF CURED FILM USING THE SAME Fujifilm Corporation (JP) 2010-06-16 EP disclosed
CN-101681110-A Positive photosensitive resin composition and method for forming cured film using the same SATOSHI TAKITA 2010-03-24 CN disclosed
EP-2154571-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING CURED FILM THEREFROM Fujifilm Corporation (JP) 2010-02-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180009775-A1 LATENT ACIDS AND THEIR USE LTA, C1S, C9 SMN1; SMN2 4885/4885TSHR 3529/4885CTSL 500/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.