Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL6313575

CC(C)=C(C(=O)O)C(C)CC(C)O.N

nearest known ligand 0.36

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Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL6313571 0.77 FOLH1 (0.30)
SCHEMBL701328 0.71
Acetic Acid SCHEMBL27243 0.70 FFAR3 (0.47) TP53
SCHEMBL14584344 0.68 FFAR3 (0.35) TP53
SCHEMBL27903067 0.68 TSHR (0.37) TP53
Methacrylic Acid SCHEMBL2544208 0.67 TSHR (0.38) TP53
Methacrylic Acid SCHEMBL9779496 0.67 TSHR (0.38) TP53
Bicarbonate SCHEMBL15411238 0.67 TP53 (0.47) TP53
SCHEMBL3831921 0.67 CA1 (0.53)
Acetic Acid SCHEMBL1133178 0.66 RNPEP (0.46) TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed