Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FOLH1 | Q04609 | 2/20 | 0.30 |
| ▸ | NAALAD2 | Q9Y3Q0 | 2/20 | 0.30 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.30 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2820638 | 0.85 | FFAR3 (0.35) | FOLH1NAALAD2GABRR1CYP1A2 | |
| SCHEMBL2820641 | 0.85 | FFAR3 (0.35) | FOLH1NAALAD2GABRR1CYP1A2 | |
| SCHEMBL4460559 | 0.85 | FFAR3 (0.35) | FOLH1NAALAD2GABRR1CYP1A2 | |
| SCHEMBL7094019 | 0.79 | GABRR1 (0.33) | GABRR1 | |
| SCHEMBL3515511 | 0.78 | ALDH1A1 (0.32) | FOLH1NAALAD2GABRR1CYP1A2 | |
| SCHEMBL3515517 | 0.78 | ALDH1A1 (0.32) | FOLH1NAALAD2GABRR1CYP1A2 | |
| Ammonia Solution, Strong SCHEMBL6313575 | 0.77 | TP53 (0.31) | — | |
| SCHEMBL7866889 | 0.76 | — | — | |
| Ammonia Solution, Strong SCHEMBL29170723 | 0.76 | ALDH1A1 (0.34) | — | |
| Bromide SCHEMBL7118673 | 0.74 | ACE2 (0.49) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6887643-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20040053156-A1 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2004-03-18 | — | — | US | disclosed |
| EP-1388758-A1 | Photosensitive heat resistant resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2004-02-11 | — | — | EP | disclosed |