Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | PPARG | P37231 | 1/20 | 0.47 |
| ▸ | ENPP2 | Q13822 | 4/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | ENPP3 | O14638 | 3/20 | 0.43 |
| ▸ | ENPP1 | P22413 | 3/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547500 | 0.91 | TDP1 (0.50) | ALDH1A1LMNAPPARGENPP2MEN1 | |
| SCHEMBL382761 | 0.89 | TDP1 (0.47) | ALDH1A1LMNAPPARGENPP2MEN1 | |
| SCHEMBL5709631 | 0.87 | TDP1 (0.46) | ALDH1A1LMNAPPARGENPP2MEN1 | |
| SCHEMBL383459 | 0.87 | MEN1 (0.56) | ALDH1A1LMNAPPARGENPP2MEN1 | |
| SCHEMBL7133265 | 0.87 | SMN1; SMN2 (0.54) | ALDH1A1LMNATDP1HTTSMN1; SMN2 | |
| SCHEMBL3955400 | 0.87 | SMN1; SMN2 (0.54) | ALDH1A1LMNATDP1HTTSMN1; SMN2 | |
| SCHEMBL4072539 | 0.85 | MEN1 (0.55) | ALDH1A1LMNAPPARGENPP2MEN1 | |
| SCHEMBL2284308 | 0.85 | MEN1 (0.51) | ALDH1A1LMNAPPARGENPP2MEN1 | |
| SCHEMBL2065834 | 0.82 | TDP1 (0.65) | ALDH1A1LMNAENPP2MEN1KMT2A | |
| SCHEMBL1047078 | 0.81 | TDP1 (0.49) | ALDH1A1LMNAPPARGENPP2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6861198-B2 | Negative resist material and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-01 | — | — | US | disclosed |
| US-20040023151-A1 | Negative resist material and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. | 2004-02-05 | — | — | US | disclosed |