SCHEMBL6314764

SCHEMBL6314764

CC(N)c1ccccc1Cc1ccccc1C(C)N

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
NFKB1 P19838 1/20 0.43
PNMT P11086 1/20 0.43
LMNA P02545 2/20 0.42
ALDH1A1 P00352 1/20 0.42
GLA P06280 1/20 0.42
SLC6A2 P23975 3/20 0.39
SLC6A4 P31645 2/20 0.39
SLC6A3 Q01959 2/20 0.39
TAAR1 Q96RJ0 3/20 0.38
MAOA P21397 1/20 0.38
SIGMAR1 Q99720 1/20 0.38
CYP2A6 P11509 1/20 0.38
ADORA2A P29274 1/20 0.38
ADORA1 P30542 1/20 0.38
HSPA5 P11021 1/20 0.37
ADRA2A P08913 1/20 0.37
ADRA2C P18825 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL855072 0.87 CYP2D6 (0.48) CYP2D6SLC6A2SLC6A4SLC6A3TAAR1
SCHEMBL1160889 0.87 CYP2D6 (0.48) CYP2D6SLC6A2SLC6A4SLC6A3TAAR1
SCHEMBL25066278 0.84 CYP2D6 (0.42) CYP2D6CYP1A2CYP3A4NFKB1PNMT
SCHEMBL8285923 0.84 CYP2D6 (0.42) CYP2D6CYP1A2CYP3A4NFKB1PNMT
SCHEMBL27651476 0.84 PNMT (0.43) CYP2D6CYP1A2CYP3A4NFKB1PNMT
SCHEMBL13795689 0.84 CYP2D6 (0.42) CYP2D6CYP1A2CYP3A4NFKB1PNMT
SCHEMBL23457325 0.82 SMN1; SMN2 (0.37) CYP2D6CYP1A2CYP3A4NFKB1PNMT
SCHEMBL8364662 0.82 GABRA1 (0.43) CYP2D6CYP1A2CYP3A4NFKB1PNMT
SCHEMBL8023560 0.82 CYP2D6 (0.41) CYP2D6CYP1A2CYP3A4NFKB1PNMT
SCHEMBL14645082 0.82 CYP2D6 (0.41) CYP2D6CYP1A2CYP3A4NFKB1PNMT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
EP-0878740-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1998-11-18 EP disclosed