SCHEMBL6314810

SCHEMBL6314810

CCN(CC)c1ccc(Oc2ccc(N(CC)CC)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.56
L3MBTL1 Q9Y468 4/20 0.56
MAPK1 P28482 3/20 0.56
GFER P55789 3/20 0.56
TSHR P16473 3/20 0.56
PSMD14 O00487 1/20 0.56
CYP3A4 P08684 1/20 0.56
RECQL P46063 1/20 0.56
TDP1 Q9NUW8 1/20 0.56
ALDH3A1 P30838 1/20 0.52
ALDH1A3 P47895 1/20 0.52
MAPT P10636 5/20 0.47
GAA P10253 3/20 0.45
SMN1; SMN2 Q16637 2/20 0.45
HTT P42858 2/20 0.45
NPC1 O15118 2/20 0.45
RAB9A P51151 2/20 0.45
KDM4E B2RXH2 2/20 0.45
CNR2 P34972 1/20 0.45
LMNA P02545 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15489413 0.88 MAPT (0.53) ALDH1A1L3MBTL1MAPK1GFERTSHR
SCHEMBL12635866 0.86 ST14 (0.57) ALDH1A1L3MBTL1MAPK1GFERTSHR
SCHEMBL12636510 0.84 PGR (0.48) ALDH1A1L3MBTL1MAPK1GFERTSHR
SCHEMBL1735497 0.84 ALDH1A1 (0.74) ALDH1A1L3MBTL1MAPK1GFERTSHR
SCHEMBL1263095 0.83 ALDH1A1 (0.60) ALDH1A1L3MBTL1MAPK1GFERTSHR
SCHEMBL26321894 0.81 ALDH1A1 (0.58) ALDH1A1L3MBTL1MAPK1GFERTSHR
SCHEMBL9806020 0.81 NQO1 (0.64) ALDH1A1L3MBTL1MAPK1GFERTSHR
Hydrochloric Acid SCHEMBL8046149 0.81 ALDH1A1 (0.70) ALDH1A1L3MBTL1MAPK1GFERTSHR
Hydrochloric Acid SCHEMBL8046146 0.81 ALDH1A1 (0.70) ALDH1A1L3MBTL1MAPK1GFERTSHR
SCHEMBL7931718 0.79 ALDH1A1 (0.50) ALDH1A1L3MBTL1MAPK1GFERTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
EP-0878740-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1998-11-18 EP disclosed
EP-0214852-B1 PERFLUOROAMINOETHERS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-10-28 EP disclosed
US-5049670-A Pour point MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-09-17 US disclosed
US-4929725-A NONFLAMMABLE, HYDRAULIC FLUIDS MOORE GEORGE G I (US) 1990-05-29 US disclosed
US-4788339-A HIGH BOILING, LOW POUR POINT; HYDRAULIC FLUIDS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-11-29 US disclosed
US-4500623-A Photoconductive compositions comprising an organic photoconductor and a thioamide compound and electrophotographic light-sensitive materials using the compositions FUJI PHOTO FILM CO., LTD. (JP) 1985-02-19 US disclosed
US-4461821-A Photoconductive compositions and electrophotographic photosensitive materials comprising an organic photoconductor and a thiourea compound FUJI PHOTO FILM CO., LTD. (JP) 1984-07-24 US disclosed
US-4448869-A HYDROXY AND CARBOXY OR ACYL SUBSTITUTED BENZENE OR NAPHTHALENE FUJI PHOTO FILM CO., LTD. (JP) 1984-05-15 US disclosed
US-4447515-A DIACYLAMINE COMPOUND ADDED FUJI PHOTO FILM CO., LTD. (JP) 1984-05-08 US disclosed
US-4444863-A UREA COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1984-04-24 US disclosed