SCHEMBL631548

SCHEMBL631548

CCC1(C=C(C)C(=O)OC)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28596235 0.89
SCHEMBL21385283 0.85 GLO1 (0.38)
SCHEMBL18205741 0.84
SCHEMBL28735700 0.84
SCHEMBL21385282 0.82 HCAR2 (0.32)
SCHEMBL3392711 0.80
SCHEMBL782181 0.80
SCHEMBL4631289 0.77 ALDH1A1 (0.32)
SCHEMBL29935410 0.74
SCHEMBL29085439 0.73 TSHR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 280 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114149530-B Alkali-soluble polymer for preparing LDI dry film and preparation method thereof 保定乐凯新材料股份有限公司 2023-07-21 CN claimed
CN-116179096-A Identification adhesive tape and preparation method thereof 东莞澳中新材料科技股份有限公司 2023-05-30 CN claimed
CN-115746186-A Acrylic prepolymer containing oxetane functional groups, preparation and application thereof 湖北固润科技股份有限公司 2023-03-07 CN claimed
CN-113130113-A Conductive material composition and conductive material prepared from same 财团法人工业技术研究院 2021-07-16 CN claimed
CN-108255018-B Photoresist composition comprising poly (p-hydroxystyrene) epoxy resin as film-forming resin 湖北固润科技股份有限公司 2020-12-11 CN claimed
CN-108864937-B Hard coating resin composition, hard coating sheet and display device 韩国生产技术研究院 2020-09-22 CN claimed
CN-107450269-B High-toughness light-sensitive epoxy acrylic resin composition capable of being developed by weak alkaline water and preparation method thereof 浙江福斯特新材料研究院有限公司 2020-09-15 CN claimed
CN-110872469-A Thermosetting composition, cured film and color filter 捷恩智株式会社 2020-03-10 CN claimed
EP-3252110-B1 ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER MINEBEA MITSUMI INC (JP) 2019-04-24 EP claimed
US-10167439-B2 Ultraviolet curable resin composition and sliding member MINEBEA MITSUMI INC. (JP) 2019-01-01 US claimed
US-20170349851-A1 ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER MINEBEA MITSUMI INC. (JP) 2017-12-07 US claimed
EP-3252110-A1 ULTRAVIOLET CURABLE RESIN COMPOSITION AND SLIDING MEMBER Minebea Mitsumi Inc. (JP) 2017-12-06 EP claimed
US-20160053131-A1 COATING COMPOSITIONS FOR FORMING TONER COATINGS ISP INVESTMENTS INC. (US) 2016-02-25 US claimed
US-20160046825-A1 HYDROPHOBIC COATING COMPOSITIONS FOR FORMING TONER RECEPTIVE COATINGS ISP INVESTMENTS INC. (US) 2016-02-18 US claimed
WO-2014160696-A1 HYDROPHOBIC COATING COMPOSITIONS FOR FORMING TONER RECEPTIVE COATINGS ISP INVESTMENTS INC. (US) 2014-10-02 WO claimed
WO-2014160631-A1 COATING COMPOSITIONS FOR FORMING TONER COATINGS ISP INVESTMENTS INC. (US) 2014-10-02 WO claimed
WO-2014160754-A1 HYDROPHOBIC COATING COMPOSITIONS FOR FORMING TONER RECEPTIVE COATINGS ISP INVESTMENTS INC. (US) 2014-10-02 WO claimed
CN-118355539-A Nonaqueous electrolyte and lithium ion secondary battery 第一工业制药株式会社 2024-07-16 CN disclosed
CN-101107565-A Pattern forming material, pattern forming apparatus and permanent pattern forming method FUJI PHOTO FILM CO LTD (JP) 2008-01-16 CN disclosed
CN-1977221-A Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display FUJI PHOTO FILM CO LTD (JP) 2007-06-06 CN disclosed