Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLO1 | Q04760 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22993864 | 0.98 | GLO1 (0.40) | GLO1ALDH1A1HPGDNPSR1LMNA | |
| SCHEMBL16445418 | 0.98 | GLO1 (0.40) | GLO1ALDH1A1HPGDNPSR1LMNA | |
| SCHEMBL29117593 | 0.98 | GLO1 (0.40) | GLO1ALDH1A1HPGDNPSR1LMNA | |
| SCHEMBL2987392 | 0.98 | GLO1 (0.40) | GLO1ALDH1A1HPGDNPSR1LMNA | |
| SCHEMBL25563386 | 0.96 | GLO1 (0.41) | GLO1ALDH1A1HPGDNPSR1LMNA | |
| SCHEMBL28585644 | 0.92 | GLO1 (0.44) | GLO1ALDH1A1NPSR1LMNAHSD17B10 | |
| SCHEMBL28473155 | 0.86 | HCAR2 (0.34) | ALDH1A1GAA | |
| SCHEMBL29117696 | 0.84 | PPM1B (0.33) | — | |
| SCHEMBL9801790 | 0.84 | PPM1B (0.33) | — | |
| SCHEMBL1581914 | 0.84 | ALDH1A1 (0.39) | GLO1ALDH1A1HPGDNPSR1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101256355-B | Composition for immersion lithography and immersion lithography method | ROHM & HAAS ELECT MAT | 2013-03-27 | — | — | CN | claimed |
| CN-112980549-B | High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity | 英菲诺姆国际有限公司 | 2023-12-15 | — | — | CN | disclosed |
| CN-116981758-A | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | 英菲诺姆国际有限公司 | 2023-10-31 | — | — | CN | disclosed |
| CN-116693730-A | Method for removing polymer terminal thioester group | 杭州翰亚微电子科技有限公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-104407501-B | Compositions and methods for photolithography | 罗门哈斯电子材料有限公司 | 2022-03-25 | — | — | CN | disclosed |
| EP-2420891-B1 | Process for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2021-06-23 | — | — | EP | disclosed |
| CN-112925167-A | Photoresist resin with photoacid activity and photoresist | 宁波南大光电材料有限公司 | 2021-06-08 | — | — | CN | disclosed |
| CN-112920314-A | Acid-activated resin and photoresist | 宁波南大光电材料有限公司 | 2021-06-08 | — | — | CN | disclosed |
| CN-108003972-B | Lubricating oil composition for diesel engine and preparation method thereof | 中国石油化工股份有限公司 | 2020-10-27 | — | — | CN | disclosed |
| WO-2020138183-A1 | METHOD FOR RECYCLING NITRILE RUBBER | 日本ゼオン株式会社 | 2020-07-02 | — | — | WO | disclosed |
| CN-101256355-A | Composition for immersion lithography and immersion lithography method | ROHM & HAAS ELECT MAT (US) | 2008-09-03 | — | — | CN | disclosed |
| EP-1959479-A2 | Electronic device manufacture | Rohm and Haas Electronic Materials LLC (US) | 2008-08-20 | — | — | EP | disclosed |
| US-20080193872-A1 | Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-08-14 | — | — | US | disclosed |
| CN-101218225-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2008-07-09 | — | — | CN | disclosed |
| EP-1918778-A2 | Compositions and processes for immersion lithography | Rohm and Haas Electronic Materials LLC (US) | 2008-05-07 | — | — | EP | disclosed |
| US-7326518-B2 | Photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-02-05 | — | — | US | disclosed |
| US-20060246373-A1 | Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-11-02 | — | — | US | disclosed |
| US-20060172224-A1 | Photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-08-03 | — | — | US | disclosed |
| US-20060172223-A1 | Photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-08-03 | — | — | US | disclosed |
| EP-1662320-A1 | Photoresist compositions | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-05-31 | — | — | EP | disclosed |