SCHEMBL6322964

SCHEMBL6322964

C=Cc1ccccc1OC(C)Oc1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.38
KMT2A Q03164 2/20 0.38
GAA P10253 1/20 0.38
KDM4E B2RXH2 1/20 0.37
ALDH1A1 P00352 3/20 0.35
HPGD P15428 1/20 0.35
NFE2L2 Q16236 2/20 0.35
MEN1 O00255 1/20 0.34
CYP3A4 P08684 1/20 0.34
POLB P06746 2/20 0.34
TRPA1 O75762 1/20 0.33
HTT P42858 1/20 0.33
ADRA2A P08913 2/20 0.33
ADRA2B P18089 2/20 0.33
ADRA2C P18825 2/20 0.33
MTNR1A P48039 1/20 0.33
MTNR1B P49286 1/20 0.33
HDAC8 Q9BY41 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
CHRNB4 P30926 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7642123 0.83 ALDH1A1 (0.40) LMNAKMT2AKDM4EALDH1A1NFE2L2
SCHEMBL9617076 0.82 KDM4E (0.44) LMNAKMT2AGAAKDM4EALDH1A1
SCHEMBL419697 0.81 ALDH1A1 (0.43) LMNAKMT2AALDH1A1MEN1CYP3A4
SCHEMBL3367704 0.80 ALDH1A1 (0.36) LMNAKMT2AALDH1A1HPGDNFE2L2
SCHEMBL6377765 0.79 ALDH1A1 (0.44) LMNAKMT2AKDM4EALDH1A1HPGD
SCHEMBL542873 0.78 KDM4E (0.50) LMNAKMT2AGAAKDM4EALDH1A1
SCHEMBL3695401 0.78 ALDH1A1 (0.48) LMNAKMT2AGAAKDM4EALDH1A1
SCHEMBL19971519 0.78 ALDH1A1 (0.38) LMNAKMT2AALDH1A1HPGDNFE2L2
SCHEMBL8004381 0.77 ALDH1A1 (0.34) LMNAKMT2AALDH1A1MEN1CYP3A4
SCHEMBL1395548 0.77 LMNA (0.37) LMNAKMT2AALDH1A1HPGDMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6841488-B2 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-01-11 US disclosed
US-20030082926-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2003-05-01 US disclosed
EP-1059314-A1 A resist composition Wako Pure Chemical Industries, Ltd. (JP) 2000-12-13 EP disclosed