Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.46 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.46 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.46 |
| ▸ | DGKA | P23743 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | PAM | P19021 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | PRKCA | P17252 | 1/20 | 0.37 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.37 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.37 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.37 |
| ▸ | FNTA | P49354 | 1/20 | 0.36 |
| ▸ | FNTB | P49356 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9687766 | 0.98 | GPR84 (0.42) | GPR84FFAR1FFAR4DGKATSHR | |
| SCHEMBL7696786 | 0.91 | — | — | |
| SCHEMBL11886036 | 0.83 | GPR84 (0.52) | GPR84FFAR1FFAR4DGKATSHR | |
| SCHEMBL7774212 | 0.83 | GPR84 (0.52) | GPR84FFAR1FFAR4DGKATSHR | |
| SCHEMBL8454940 | 0.83 | GPR84 (0.52) | GPR84FFAR1FFAR4DGKATSHR | |
| SCHEMBL7534986 | 0.83 | GPR84 (0.52) | GPR84FFAR1FFAR4DGKATSHR | |
| SCHEMBL28455749 | 0.83 | DGKA (0.50) | GPR84FFAR1FFAR4DGKATSHR | |
| SCHEMBL10802487 | 0.82 | TSHR (0.55) | GPR84FFAR1FFAR4TSHRPAM | |
| SCHEMBL23881641 | 0.81 | GPR84 (0.50) | GPR84FFAR1FFAR4DGKATSHR | |
| SCHEMBL12375156 | 0.81 | DGKA (0.64) | GPR84FFAR1FFAR4DGKATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114729246-B | Adhesive for electronic tag and electronic tag | 三井化学株式会社 | 2024-05-28 | — | — | CN | disclosed |
| CN-114729246-A | Adhesive for electronic tag and electronic tag | 三井化学株式会社 | 2022-07-08 | — | — | CN | disclosed |
| CN-107003604-B | Photosensitive resin composition, method for producing color filter, and liquid crystal display device | 奇美实业股份有限公司 | 2020-08-11 | — | — | CN | disclosed |
| CN-106933033-B | Photosensitive resin composition, optical filter and manufacturing method thereof, and liquid crystal display device | 奇美实业股份有限公司 | 2020-03-13 | — | — | CN | disclosed |
| EP-2154162-B1 | REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL | SHOWA DENKO KK (JP) | 2019-07-17 | — | — | EP | disclosed |
| US-8329065-B2 | Carbon nanotube-containing composition, composite, and methods for producing them | MITSUBISHI RAYON CO., LTD. (JP) | 2012-12-11 | — | — | US | disclosed |
| EP-1866357-B1 | (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF | SHOWA DENKO KK (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-8044235-B2 | (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof | SHOWA DENKO K.K. (JP) | 2011-10-25 | — | — | US | disclosed |
| EP-1812381-B1 | ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE | SHOWA DENKO KK (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7790354-B2 | Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same | SHOWA DENKO K.K. (JP) | 2010-09-07 | — | — | US | disclosed |
| US-20040009428-A1 | Resist curable resin composition and cured article thereof | SHOWA DENKO K.K. (JP) | 2004-01-15 | — | — | US | disclosed |
| WO-2003062296-A1 | PHOSPHORUS-CONTAINING URETHANE (METH)ACRYLATE COMPOUNDS AND PHOTOSENSITIVE COMPOSITIONS | SHOWA DENKO K. K. (JP) | 2003-07-31 | — | — | WO | disclosed |
| WO-2003005126-A1 | RESIST CURABLE RESIN COMPOSITION AND CURED ARTICLE THEREOF | SHOWA DENKO K.K. (JP) | 2003-01-16 | — | — | WO | disclosed |
| US-6153719-A | PHOSPHORUS-CONTAINING COMPOUND HAVING AT LEAST ONE P--OH GROUP AND AT LEAST ONE ORGANIC MOIETY CHARACTERIZED BY THE PRESENCE OF AN ETHYLENICALLY UNSATURATED GROUP;PARTICULARLY USEFUL AS A SEALER FOR AN ADHESIVE JOINT. | LORD CORPORATION (US) | 2000-11-28 | — | — | US | disclosed |
| EP-1053271-A1 | THIOL-CURED EPOXY COMPOSITION | Lord Corporation (US) | 2000-11-22 | — | — | EP | disclosed |
| WO-1999040142-A1 | THIOL-CURED EPOXY COMPOSITION | LORD CORPORATION (US) | 1999-08-12 | — | — | WO | disclosed |
| US-5770655-A | ACRYLATE MONOMER WITH MULTICYCLIC FUSED RING IN ESTER GROUP, OPTICAL FIBERS AND DISKS, CLARITY AND IMPACT STRENGTH, TETRACYCLODODECYL ACRYLATE | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1998-06-23 | — | — | US | disclosed |
| EP-0671433-B1 | Polymer composition and core-shell elastomer used therefor | MITSUI CHEMICALS INC (JP) | 1998-06-17 | — | — | EP | disclosed |
| US-5574100-A | ALPHA-OLEFIN-CYCLIC OLEFIN COPOLYMER, BUTADIENE-STYRENE COPOLYMER CORE, ALICYCLIC ACRYLATE SHELL | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1996-11-12 | — | — | US | disclosed |
| EP-0671433-A1 | Polymer composition and core-shell elastomer used therefor | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1995-09-13 | — | — | EP | disclosed |