⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29375921 | 0.77 | — | — | |
| SCHEMBL31249470 | 0.75 | — | — | |
| SCHEMBL11134126 | 0.74 | — | — | |
| SCHEMBL27506271 | 0.72 | — | — | |
| SCHEMBL27945379 | 0.70 | KDM1A (0.35) | — | |
| SCHEMBL28036686 | 0.70 | KDM1A (0.35) | — | |
| SCHEMBL27898996 | 0.68 | — | — | |
| SCHEMBL27612651 | 0.64 | — | — | |
| SCHEMBL4554819 | 0.63 | ALDH1A1 (0.33) | — | |
| SCHEMBL27447721 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107207456-A | Latent acid and application thereof | 巴斯夫欧洲公司 | 2017-09-26 | — | — | CN | disclosed |
| CN-102781911-B | Latent acids and their use | BASF SE | 2015-07-22 | — | — | CN | disclosed |
| CN-102186815-B | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2014-07-30 | — | — | CN | disclosed |
| CN-101952269-B | Sulphonium salt initiators | BASF SE | 2014-06-25 | — | — | CN | disclosed |
| CN-102026967-B | Sulphonium salt initiators | CIBA HOLDING INC | 2013-09-18 | — | — | CN | disclosed |
| CN-101522613-B | Sulphonium salt photoinitiators | CIBA HOLDING INC | 2013-03-06 | — | — | CN | disclosed |
| CN-102781911-A | Latent acids and their use | BASF SE | 2012-11-14 | — | — | CN | disclosed |
| CN-1989455-B | Oxime derivatives and the use therof as latent acids | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2011-12-21 | — | — | CN | disclosed |
| CN-102186815-A | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2011-09-14 | — | — | CN | disclosed |
| CN-102056913-A | Sulfonium derivatives and the use thereof as latent acids | BASF SE | 2011-05-11 | — | — | CN | disclosed |
| CN-100383665-C | Onium salts and their use as latent acids | CIBA SC HOLDING AG (CH) | 2008-04-23 | — | — | CN | disclosed |
| CN-100338056-C | Substituted oxime derivatives and their use as latent acids | LIBA SPECIALTY CHEMICALS HOLDI (CH) | 2007-09-19 | — | — | CN | disclosed |
| CN-1989455-A | Oxime derivatives and the use therof as latent acids | CIBA SC HOLDING AG (CH) | 2007-06-27 | — | — | CN | disclosed |
| CN-1751269-A | Halogenated oxime derivatives and their use as latent acids | CIBA SC HOLDING AG (CH) | 2006-03-22 | — | — | CN | disclosed |
| CN-1662853-A | Onium salts and their use as latent acids | CIBA SC HOLDING AG (CH) | 2005-08-31 | — | — | CN | disclosed |
| CN-1213343-C | Iodonium salt used as potential acid provider | CIBA SPECIATY CHEMICALS HOLDIN (CH) | 2005-08-03 | — | — | CN | disclosed |
| US-6899999-B2 | Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-05-31 | — | — | US | disclosed |
| CN-1512990-A | Substituted oxime derivatives and their use as latent acids | �������⻯ѧƷ�ع�����˾ | 2004-07-14 | — | — | CN | disclosed |
| US-20030022102-A1 | Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-01-30 | — | — | US | disclosed |
| CN-1306224-A | Iodonium salt used as potential acid provider | CIBA SPECIATY CHEMICALS HOLDIN (CH) | 2001-08-01 | — | — | CN | disclosed |