⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL149016 | 0.81 | CYP2D6 (0.32) | — | |
| Fluoride SCHEMBL4617191 | 0.78 | CYP2D6 (0.30) | — | |
| Bromide SCHEMBL2351772 | 0.78 | CYP2D6 (0.30) | — | |
| Hydrochloric Acid SCHEMBL5153044 | 0.78 | CYP2D6 (0.30) | — | |
| Water SCHEMBL2820889 | 0.78 | CYP2D6 (0.30) | — | |
| SCHEMBL6900156 | 0.74 | — | — | |
| Nitric Acid SCHEMBL8210908 | 0.70 | CA5A (0.35) | — | |
| Oxalic Acid SCHEMBL1052749 | 0.68 | ALOX15 (0.33) | — | |
| SCHEMBL1919563 | 0.67 | — | — | |
| SCHEMBL27832293 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117908329-A | KrF positive photoresist and preparation method thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-114163564-B | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-02-28 | — | — | CN | claimed |
| CN-114163564-A | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-03-11 | — | — | CN | claimed |
| CN-113999340-A | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-02-01 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| CN-114163564-B | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-02-28 | — | — | CN | disclosed |
| CN-114163564-A | Film-forming resin containing cholic acid-butenoate derivative and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-03-11 | — | — | CN | disclosed |
| CN-113999340-A | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2022-02-01 | — | — | CN | disclosed |
| CN-113717314-A | Photosensitive film-forming resin, photoresist composition and preparation method thereof | 江苏集萃光敏电子材料研究所有限公司 | 2021-11-30 | — | — | CN | disclosed |
| CN-111123649-A | Negative photoresist composition containing high-heat-resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2020-05-08 | — | — | CN | disclosed |
| US-6943011-B2 | Localization and characterization of the Wilms' tumor gene | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-09-13 | — | — | US | disclosed |
| US-20020128196-A1 | Localization and characterization of the Wilms' tumor gene | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-09-12 | — | — | US | disclosed |
| US-20020082394-A1 | Localization and characterization of the wilms' tumor gene | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2002-06-27 | — | — | US | disclosed |
| US-6316599-B1 | PREFERENTIAL ANTIBODY FOR USE IN THE DIAGNOSIS AND DETECTION AND TREATMENT OF TUMORS | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2001-11-13 | — | — | US | disclosed |
| US-5726288-A | DNA WITH NUCLEIC ACID SEQUENCE | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 1998-03-10 | — | — | US | disclosed |
| US-4551265-A | Fluorescent dyestuffs, processes for their preparation and their use as laser dyestuffs | BAYER AKTIENGESELLSCHAFT (DE) | 1985-11-05 | — | — | US | disclosed |
| US-4338258-A | Fluorescent dyestuffs, processes for their preparation and their use as laser dyestuffs | BAYER AKTIENGESELLSCHAFT (DE) | 1982-07-06 | — | — | US | disclosed |
| US-4301091-A | FOR WHITENING AND FOR LASER EMISSION | BAYER AKTIENGESELLSCHAFT (DE) | 1981-11-17 | — | — | US | disclosed |