SCHEMBL6327586

SCHEMBL6327586

CCOC([SiH3])C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8889491 0.73
SCHEMBL59849 0.69
SCHEMBL3895612 0.69 LMNA (0.47)
SCHEMBL12207119 0.67 LMNA (0.53)
SCHEMBL4094836 0.67 LMNA (0.53)
Methane SCHEMBL25432464 0.67
SCHEMBL27521268 0.67
SCHEMBL3318330 0.67
SCHEMBL13409663 0.67
SCHEMBL3414553 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260022136-A1 Silicon Compounds And Methods For Depositing Films Using Same VERSUM MAT US LLC (US) 2026-01-22 US disclosed
US-12441747-B2 Silicon compounds and methods for depositing films using same VERSUM MATERIALS US, LLC (US) 2025-10-14 US disclosed
EP-4325548-A2 SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME Versum Materials US, LLC (US) 2024-02-21 EP disclosed
US-20230123377-A1 Silicon Compounds And Methods For Depositing Films Using Same VERSUM MATERIALS US, LLC 2023-04-20 US disclosed
CN-110952074-A Silicon compound and method for depositing film using the same 弗萨姆材料美国有限责任公司 2020-04-03 CN disclosed
US-20200048286-A1 SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME VERSUM MAT US LLC (US) 2020-02-13 US disclosed
US-20050045559-A1 Compositions and methods for separating constituents AGILENT TECHNOLOGIES, INC. 2005-03-03 US disclosed