⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6364629 | 0.81 | ALDH1A1 (0.35) | — | |
| SCHEMBL9502102 | 0.78 | — | — | |
| SCHEMBL8001485 | 0.75 | ALDH1A1 (0.32) | — | |
| SCHEMBL1788888 | 0.73 | — | — | |
| SCHEMBL1787121 | 0.73 | — | — | |
| SCHEMBL21081839 | 0.71 | — | — | |
| SCHEMBL19249200 | 0.70 | — | — | |
| SCHEMBL968685 | 0.69 | — | — | |
| SCHEMBL11458460 | 0.69 | — | — | |
| SCHEMBL15448398 | 0.69 | HSD17B10 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6878672-B2 | Herbicidal emulsion compositions | TOKUYAMA CORPORATION (JP) | 2005-04-12 | — | — | US | disclosed |
| US-20030191024-A1 | Herbicidal emulsion compositions | TOKUYAMA CORPORATION (JP) | 2003-10-09 | — | — | US | disclosed |
| EP-0901752-B1 | Herbicidal composition | TOKUYAMA CORP (JP) | 2002-11-20 | — | — | EP | disclosed |
| EP-0872484-B1 | ORGANOSILICON COMPOUNDS, LIQUID-CRYSTAL COMPOSITION, AND LIQUID-CRYSTAL DISPLAY ELEMENT | CHISSO CORP (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020047103-A1 | Liquid crystalline compounds having a silane diyl group, liquid crystal compositions comprising the same and liquid crystal display devices | CHISSO PETROCHEMICAL CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |
| EP-0893421-B1 | ALKENYL COMPOUNDS, LIQUID CRYSTAL COMPOSITIONS, AND LIQUID CRYSTAL DISPLAY DEVICES | CHISSO CORP (JP) | 2002-03-06 | — | — | EP | disclosed |
| US-6337034-B1 | COMPOUNDS HAVING WIDE TEMPERATURE RANGE OF LIQUID CRYSTAL PHASE, LOW VISCOSITY, LOW THRESHOLD VOLTAGE AND EXCELLENT STABILITY, WHICH ARE READILY MIXED WITH VARIOUS LIQUID CRYSTAL MATERIALS AND GOOD IN SOLUBILITY AT LOW TEMPERATURE | CHISSO CORPORATION (JP) | 2002-01-08 | — | — | US | disclosed |
| US-6329027-B1 | Chlorobenzene derivatives, liquid-crystal composition, and liquid-crystal display elements | CHISSO CORPORATION (JP) | 2001-12-11 | — | — | US | disclosed |
| EP-1160251-A2 | Liquid crystalline compounds having a silane diyl group, liquid crystal compositions comprising the same and liquid crystal display devices | CHISSO CORPORATION (JP) | 2001-12-05 | — | — | EP | disclosed |
| US-6231934-B1 | Alkenyl compound, liquid crystal composition, and liquid crystal display device | CHISSO CORPORATION (JP) | 2001-05-15 | — | — | US | disclosed |
| EP-0959060-A1 | CHLOROBENZENE DERIVATIVES, LIQUID-CRYSTAL COMPOSITION, AND LIQUID-CRYSTAL DISPLAY ELEMENTS | CHISSO CORPORATION (JP) | 1999-11-24 | — | — | EP | disclosed |
| EP-0774456-B1 | Ethenyl amide compounds production process | TOKUYAMA CORP (JP) | 1999-07-14 | — | — | EP | disclosed |
| EP-0926120-A1 | FLUORINATED ALKYL ETHER COMPOUNDS, LIQUID-CRYSTAL COMPOSITIONS, AND LIQUID-CRYSTAL DISPLAY DEVICES | CHISSO CORPORATION (JP) | 1999-06-30 | — | — | EP | disclosed |
| EP-0901752-A1 | Herbicidal composition | TOKUYAMA CORPORATION (JP) | 1999-03-17 | — | — | EP | disclosed |
| EP-0893421-A1 | ALKENYL COMPOUNDS, LIQUID CRYSTAL COMPOSITIONS, AND LIQUID CRYSTAL DISPLAY DEVICES | CHISSO CORPORATION (JP) | 1999-01-27 | — | — | EP | disclosed |
| EP-0885875-A1 | VINYLENE COMPOUNDS AND LIQUID-CRYSTAL COMPOSITION | CHISSO CORPORATION (JP) | 1998-12-23 | — | — | EP | disclosed |
| EP-0872484-A1 | ORGANOSILICON COMPOUNDS, LIQUID-CRYSTAL COMPOSITION, AND LIQUID-CRYSTAL DISPLAY ELEMENT | CHISSO CORPORATION (JP) | 1998-10-21 | — | — | EP | disclosed |
| US-5723665-A | REACTING SCHIFF BASE WITH ACYL HALIDE UNDER LOW PRESSURE WHILE REMOVING BY-PRODUCED HYDROGEN HALIDE; AMIDATION | TOKUYAMA CORPORATION (JP) | 1998-03-03 | — | — | US | disclosed |
| EP-0774456-A1 | Ethenyl amide compounds production process | TOKUYAMA CORPORATION (JP) | 1997-05-21 | — | — | EP | disclosed |
| US-5211739-A | Herbicidal-1-(disubstituted carbamoyl or thiocarbamoyl)-1,2,4-triazol-3-yl sulfonates and thisulfonates | ROHM AND HAAS COMPANY (US) | 1993-05-18 | — | — | US | disclosed |