SCHEMBL6330818

SCHEMBL6330818

N#CCCC(F)(Cl)C(F)(F)Br

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.32
TSHR P16473 1/20 0.32
ALDH1A1 P00352 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2489268 0.70
SCHEMBL1018845 0.69
SCHEMBL1066661 0.68
SCHEMBL9438152 0.68 ALDH1A1 (0.44) CYP3A4TSHRALDH1A1TDP1
SCHEMBL11240058 0.68
SCHEMBL1366180 0.68
SCHEMBL1018924 0.67
SCHEMBL27789774 0.67
SCHEMBL8348097 0.67
SCHEMBL2490733 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6933096-B2 Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition SAMSUNG ELECTRONICS, CO., LTD. (KR) 2005-08-23 US disclosed
US-20040157151-A1 Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist composition SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-08-12 US disclosed