SCHEMBL6332804

SCHEMBL6332804

CCOC(=O)C(OC)N1CCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.41
MAPT P10636 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
LMNA P02545 2/20 0.41
KMT2A Q03164 2/20 0.41
HPGD P15428 1/20 0.41
RAB9A P51151 1/20 0.41
MAPK1 P28482 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
TSHR P16473 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C19 P33261 1/20 0.35
MEN1 O00255 1/20 0.35
SLC6A3 Q01959 5/20 0.35
SLC6A2 P23975 4/20 0.35
SLC6A4 P31645 4/20 0.35
POLB P06746 1/20 0.34
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
GAA P10253 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2960200 0.84 ALDH1A1 (0.61) ALDH1A1MAPTNPSR1LMNAKMT2A
SCHEMBL27461888 0.83 ALDH1A1 (0.40) ALDH1A1MAPTNPSR1LMNAKMT2A
SCHEMBL25171177 0.78 ALDH1A1 (0.44) ALDH1A1MAPTNPSR1LMNAKMT2A
SCHEMBL14176779 0.76 KMT2A (0.33) ALDH1A1MAPTNPSR1LMNAKMT2A
SCHEMBL6737298 0.76 ALDH1A1 (0.43) ALDH1A1MAPTNPSR1LMNAKMT2A
SCHEMBL20589054 0.76 ALDH1A1 (0.43) ALDH1A1MAPTNPSR1LMNAKMT2A
SCHEMBL4089646 0.76 ALDH1A1 (0.43) ALDH1A1MAPTNPSR1LMNAKMT2A
SCHEMBL28201107 0.76 ALDH1A1 (0.43) ALDH1A1MAPTNPSR1LMNAKMT2A
SCHEMBL14158432 0.75 ALDH1A1 (0.35) ALDH1A1LMNAKMT2AMEN1SLC6A3
SCHEMBL15415598 0.74 ALDH1A1 (0.42) ALDH1A1MAPTNPSR1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102591152-A Resist composition and patterning process SHIN ETSU EHEMICAL CO LTD 2012-07-18 CN disclosed
CN-102520581-A Method for forming photoresist pattern SHINETSU CHEMICAL CO 2012-06-27 CN disclosed
CN-101625524-A Photoresist composition and pattern forming method SHINETSU CHEMICAL CO 2010-01-13 CN disclosed
CN-100578358-C Resist polymer, resist composition and patterning manufacturing process SHINETSU CHEMICAL CO 2010-01-06 CN disclosed
CN-1607461-A Resist polymer, resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2005-04-20 CN disclosed
US-20050079446-A1 Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed
US-20050079440-A1 Novel polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed