SCHEMBL6332807

SCHEMBL6332807

CCC(C(=O)OC)N1CCCC1

nearest known ligand 0.45

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SLC6A3 Q01959 11/20 0.45
SLC6A2 P23975 10/20 0.45
SLC6A4 P31645 8/20 0.45
MAPT P10636 1/20 0.43
MAPK1 P28482 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
MEN1 O00255 1/20 0.42
ALDH1A1 P00352 1/20 0.42
LMNA P02545 1/20 0.42
KMT2A Q03164 1/20 0.42
SIGMAR1 Q99720 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11758308 0.92 SIGMAR1 (0.41) SLC6A3SLC6A2SLC6A4MAPTMAPK1
SCHEMBL23522350 0.86 SIGMAR1 (0.43) SLC6A3SLC6A2SLC6A4MAPTMAPK1
SCHEMBL22360609 0.83 SIGMAR1 (0.43) SLC6A3SLC6A2SLC6A4MEN1KMT2A
SCHEMBL2682079 0.81 MEN1 (0.44) SLC6A3SLC6A2SLC6A4MAPTMAPK1
SCHEMBL7935850 0.81 MEN1 (0.44) SLC6A3SLC6A2SLC6A4MAPTMAPK1
SCHEMBL16415742 0.81 MAPT (0.51) SLC6A3SLC6A2SLC6A4MAPTMAPK1
Hydrochloric Acid SCHEMBL2681973 0.81 MEN1 (0.44) SLC6A3SLC6A2SLC6A4MAPTMAPK1
SCHEMBL27890928 0.81 MEN1 (0.44) SLC6A3SLC6A2SLC6A4MAPTMAPK1
SCHEMBL22360513 0.80 CA1 (0.33) SLC6A3SLC6A2SLC6A4MAPTMAPK1
Hydrochloric Acid SCHEMBL2680414 0.79 ALDH1A1 (0.46) SLC6A3SLC6A2SLC6A4MAPTMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110831924-A Preparation method of levetiracetam 浙江华海药业股份有限公司 2020-02-21 CN disclosed
US-20050079446-A1 Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed
US-20050079440-A1 Novel polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-14 US disclosed