SCHEMBL6347180

SCHEMBL6347180

[CH2]C(=O)[C@H]1CC[C@H]2[C@@H]3CCC4=CC(=O)CC[C@]4(C)[C@H]3C(=O)C[C@]12C

nearest known ligand 0.84

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SERPINA6 P08185 4/20 0.84
▸ FNTA P49354 1/20 0.68
▸ FNTB P49356 1/20 0.68
▸ SMN1; SMN2 Q16637 7/20 0.60
▸ LMNA P02545 6/20 0.60
▸ POLB P06746 1/20 0.60
▸ CYP3A4 P08684 6/20 0.60
▸ ALDH1A1 P00352 6/20 0.60
▸ MAPT P10636 4/20 0.60
▸ MAPK1 P28482 4/20 0.60
▸ TSHR P16473 3/20 0.60
▸ SHBG P04278 3/20 0.60
▸ CYP2C9 P11712 2/20 0.60
▸ HIF1A Q16665 2/20 0.60
▸ NR3C2 P08235 2/20 0.60
▸ NR3C1 P04150 2/20 0.60
▸ PMP22 Q01453 2/20 0.60
▸ ABCB11 O95342 2/20 0.60
▸ CYP2C19 P33261 1/20 0.60
▸ KDM4E B2RXH2 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15904593 0.91 SERPINA6 (1.00) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL668966 0.91 SERPINA6 (1.00) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL14420894 0.91 SERPINA6 (1.00) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL14525642 0.91 SERPINA6 (1.00) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL15920543 0.91 SERPINA6 (1.00) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL9348234 0.90 SERPINA6 (0.85) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL18927106 0.90 SERPINA6 (0.85) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL9348241 0.90 SERPINA6 (0.85) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL31095098 0.88 SERPINA6 (0.82) SERPINA6FNTAFNTBSMN1; SMN2LMNA
SCHEMBL5497592 0.87 SERPINA6 (0.80) SERPINA6FNTAFNTBSMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6974658-B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS KABUSHIKI KAISHA TOSHIBA (JP) 2005-12-13 — — US disclosed
US-20030235781-A1 High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components KABUSHIKI KAISHA TOSHIBA (JP) 2003-12-25 — — US disclosed
US-6410748-B1 Alicycli c group-containing monomer KABUSHIKI KAISHA TOSHIBA (JP) 2002-06-25 — — US disclosed
US-6291129-B1 LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS KABUSHIKI KAISHA TOSHIBA (JP) 2001-09-18 — — US disclosed
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