Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4235047 | 0.61 | LMNA (0.32) | LMNAMAPTKMT2AL3MBTL1 | |
| SCHEMBL8626318 | 0.56 | — | — | |
| Methacrylic Acid SCHEMBL28090717 | 0.55 | TDP1 (0.44) | LMNAMAPT | |
| SCHEMBL13785021 | 0.55 | — | — | |
| Benzene SCHEMBL27326393 | 0.52 | FFAR3 (0.70) | LMNAMAPT | |
| Benzene SCHEMBL27782808 | 0.52 | FFAR3 (0.70) | LMNAMAPT | |
| Methacrylic Acid SCHEMBL3426195 | 0.51 | TDP1 (0.47) | LMNAMAPT | |
| Methacrylic Acid SCHEMBL3858692 | 0.51 | TDP1 (0.47) | LMNAMAPT | |
| Methacrylic Acid SCHEMBL3421717 | 0.51 | TDP1 (0.47) | LMNAMAPT | |
| Methacrylic Acid SCHEMBL225835 | 0.51 | TDP1 (0.47) | LMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6974658-B2 | HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-12-13 | — | — | US | disclosed |
| US-20030235781-A1 | High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-25 | — | — | US | disclosed |