SCHEMBL635163

SCHEMBL635163

c1cc(C2CS2)ccc1Sc1ccc(C2CS2)cc1

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 1/20 0.36
CYP3A4 P08684 1/20 0.36
TSHR P16473 1/20 0.36
MAPK1 P28482 1/20 0.36
DDAH1 O94760 1/20 0.31
NOS1 P29475 1/20 0.31
HRH3 Q9Y5N1 1/20 0.30
LMNA P02545 1/20 0.30
HPGD P15428 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2114415 0.72 KDM1A (0.44) MAPK1LMNA
SCHEMBL1093487 0.69 ESR2 (0.44) NR1H2CYP3A4TSHRMAPK1HRH3
SCHEMBL1402747 0.65 NR1H2 (0.32) NR1H2CYP3A4TSHRMAPK1
SCHEMBL3891569 0.56 MAOA (0.62) NR1H2CYP3A4TSHRMAPK1DDAH1
SCHEMBL795030 0.56 MAOA (0.62) NR1H2CYP3A4TSHRMAPK1DDAH1
SCHEMBL1276577 0.55 CRBN (0.33) HPGDL3MBTL1
SCHEMBL6150488 0.54
SCHEMBL3892294 0.54 MAOA (0.52) NR1H2CYP3A4TSHRMAPK1HPGD
SCHEMBL11119109 0.54 MAOA (0.52) NR1H2CYP3A4TSHRMAPK1HPGD
SCHEMBL3411276 0.54 MAOA (0.64) NR1H2CYP3A4TSHRMAPK1DDAH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6201061-B1 CURING A RESIN FOR OPTICAL USE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-03-13 US claimed
WO-2024146848-A1 CURABLE MATERIALS BASED ON CYCLIC THIOETHER COMPOUNDS, AND USES THEREOF DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) 2024-07-11 WO disclosed
EP-2223969-B1 RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME MITSUI CHEMICALS INC (JP) 2015-02-25 EP disclosed
US-8648130-B2 Resin composition, transparent member obtained from the resin composition, and use of the same MITSUI CHEMICALS, INC. (JP) 2014-02-11 US disclosed
EP-1775315-B1 POLYMERIZABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2012-02-22 EP disclosed
EP-1398317-B1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2011-01-12 EP disclosed
US-20100256271-A1 RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME MITSUI CHEMICALS, INC. (JP) 2010-10-07 US disclosed
EP-2223969-A1 RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME Mitsui Chemicals, Inc. (JP) 2010-09-01 EP disclosed
EP-1319966-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-05-26 EP disclosed
EP-1426392-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-24 EP disclosed
US-20010008278-A1 Process for production of optical material MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) 2001-07-19 US disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed
US-6197226-B1 COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND MITSUBISHI GAS CHEMICAL COMPANY (JP) 2001-03-06 US disclosed
US-6180753-B1 ADDING ACIDS, CURING AND SOLIDIFICATION WITH CASTING MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-01-30 US disclosed
EP-1046931-A2 Composition for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-10-25 EP disclosed
EP-1024223-A2 Process for tinting a resin for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-08-02 EP disclosed
EP-1006374-A2 Process for producing a resin having a large refractive index MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-06-07 EP disclosed
EP-0980696-A1 Process for treating a compound having epithio structures for disposal MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-02-23 EP disclosed
EP-0950905-A2 Process for producing a novel resin for optical materials having excellent color tone and transparency MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-10-20 EP disclosed
EP-0928802-A2 Process for tinting a resin having a large refractivity index and optical material tinted by the process MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1999-07-14 EP disclosed