SCHEMBL6353232

SCHEMBL6353232

CCN(CC)C1(CC)CC(=O)O1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.33
ALDH1A1 P00352 1/20 0.33
KDM4E B2RXH2 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4260971 0.69
SCHEMBL1365046 0.67
SCHEMBL14113510 0.62 LMNA (0.37) LMNAALDH1A1KDM4ECYP2C19
SCHEMBL15304338 0.62 LMNA (0.41) LMNAALDH1A1KDM4ECYP2C19
SCHEMBL11880572 0.60 KDM4E (0.34) LMNAKDM4ECYP2C19
SCHEMBL1331203 0.59
SCHEMBL11188189 0.59 SIRT2 (0.39) LMNAALDH1A1
SCHEMBL21961910 0.59
SCHEMBL9431224 0.58 KDM4E (0.33) LMNAKDM4ECYP2C19
SCHEMBL5856557 0.57 TSHR (0.36) LMNAALDH1A1KDM4ECYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6878508-B2 Resist patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-04-12 US disclosed