⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethyl Sulfoxide SCHEMBL1946114 | 0.87 | ALDH1A1 (0.35) | — | |
| SCHEMBL1106444 | 0.79 | — | — | |
| SCHEMBL16944043 | 0.76 | ALDH1A1 (0.39) | — | |
| SCHEMBL4071999 | 0.73 | — | — | |
| SCHEMBL9893964 | 0.71 | ALDH1A1 (0.36) | — | |
| SCHEMBL2745822 | 0.71 | — | — | |
| SCHEMBL1048076 | 0.71 | — | — | |
| SCHEMBL10903390 | 0.71 | — | — | |
| SCHEMBL13072431 | 0.71 | — | — | |
| SCHEMBL7438406 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2930565-B1 | STRIPPING SOLUTION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING PROCESS | TOKYO OHKA KOGYO CO LTD (JP) | 2016-11-30 | — | — | EP | claimed |
| EP-2930565-A1 | STRIPPING SOLUTION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING PROCESS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-14 | — | — | EP | claimed |
| US-8455419-B2 | Photoresist stripping agent composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-06-04 | — | — | US | claimed |
| US-20120149622-A1 | PHOTORESIST STRIPPING AGENT COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-14 | — | — | US | claimed |
| US-7317026-B2 | Sleep disorders; side effect reduction ; antihistamine antagonist | HYPNION, INC. (US) | 2008-01-08 | — | — | US | claimed |
| US-20040142972-A1 | CNS target modulators | HYPNION, INC. | 2004-07-22 | — | — | US | claimed |
| US-11965111-B2 | Surface treatment agent and surface treatment method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-04-23 | — | — | US | disclosed |
| US-20230359123-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230359123-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-09 | — | — | US | disclosed |
| US-11798810-B2 | Resist underlayer film-forming composition containing amide solvent | NISSAN CHEMICAL CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-11798810-B2 | Resist underlayer film-forming composition containing amide solvent | NISSAN CHEMICAL CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-20230314955-A1 | PHOTORESIST STRIPPER AND METHOD OF TREATING SUBSTRATE USING SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230259031-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| US-4749245-A | SUBSTRATE POLYMER AND TWO LAYERS OF HIGH MOLECULAR WEIGHT POLYMERS OF DIFFERENT SOLUBILITY AND REFRACTIVE INDEX | KURARAY CO., LTD. (JP) | 1988-06-07 | — | — | US | disclosed |
| EP-0194639-A2 | Thin film waveguide path and manufacturing method therefor | Kuraray Co., Ltd. (JP) | 1986-09-17 | — | — | EP | disclosed |
| EP-0104483-A2 | Sulfamoyl benzophenon derivatives, process for their preparation, their use, and pharmaceutical compositions based on these compounds | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-04-04 | — | — | EP | disclosed |
| US-4324721-A | 1-(4-Alkylaminonaphthylazo)-4-nitrobenzene disperse dyes | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-04-13 | — | — | US | disclosed |
| US-4070189-A | CATIONIC POLYBENZYLVINYL AMMONIUM OR PHOSPHONIUM SALT | EASTMAN KODAK COMPANY (US) | 1978-01-24 | — | — | US | disclosed |
| US-4054560-A | 1-(4-Acyloxyalkylaminonaphthylazo)-4-nitrobenzene disperse dyes | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
| US-3970617-A | POLYESTER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-07-20 | — | — | US | disclosed |